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wsi2/al0.98si0.02 multilayer laue lens for hard x-ray micro-focusing

A multi-layer film, X-ray technology, applied in the research field of precision optical components, can solve the problems of limiting the performance of hard X-ray microscopic imaging system, imperfect multi-layer film structure, reducing diffraction efficiency, etc., to reduce stress, The effect of smoothing the interface roughness and taking into account the diffraction efficiency

Active Publication Date: 2018-04-17
苏州闻道电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The accumulation of stress in the process of multilayer film deposition will greatly reduce the available aperture size and reduce the diffraction efficiency; film quality factors such as interface roughness and position error will lead to the imperfection of the multilayer film structure and affect the focusing performance
Limits the performance of hard X-ray microscopy imaging systems

Method used

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  • wsi2/al0.98si0.02 multilayer laue lens for hard x-ray micro-focusing
  • wsi2/al0.98si0.02 multilayer laue lens for hard x-ray micro-focusing
  • wsi2/al0.98si0.02 multilayer laue lens for hard x-ray micro-focusing

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Using the method of the present invention, for the application of high-throughput hard X-ray focusing microscopy experiments, a WSi 2 / Al 0.98 Si 0.02Multilayer Laue lens, working at E=14keV(λ=0.0867nm), f=17.51mm, dr out =15nm, use the inclined structure in the present embodiment:

[0040] (1) Calculate the initial structure of the multilayer Laue lens according to the lens structure formula (1,2), and select the lens inclination angle = 1.44mrad, taking into account the diffraction efficiency and stress, and the thickness ratio of the multilayer film designed this time is 0.5;

[0041] (2) Using the one-dimensional coupled wave theory, calculate the curve η of the negative first-order diffraction efficiency changing with depth z -1 (z).

[0042] (3) According to the diffraction curve η -1 (z) Select the best depth z with maximum efficiency opt = 8.20 μm.

[0043] (4) Root out the optimal depth z opt , calculate the electric field distribution on the exit surfa...

Embodiment 2

[0047] WSi for Hard X-ray Microfocusing 2 / Al 0.98 Si 0.02 Multilayer Laue lens, the multilayer Laue lens is made of WSi 2 Layers and metal Al doped with 2wt% Si are alternately plated. Multilayer Laue lens in a film layer cycle, WSi 2 The ratio of layer thickness to total film thickness is 0.1. In this embodiment, the multilayer Laue lens has an inclined structure, and the multilayer Laue lens with the inclined structure is a lens with an overall inclined fixed angle.

Embodiment 3

[0049] WSi for Hard X-ray Microfocusing 2 / Al 0.98 Si 0.02 Multilayer Laue lens, the multilayer Laue lens is made of WSi 2 Layers and metal Al doped with 2wt% Si are alternately plated. Multilayer Laue lens in a film layer cycle, WSi 2 The ratio of layer thickness to total film thickness is 0.9. In this embodiment, the multilayer Laue lens has a wedge structure. The wedge-shaped multilayer Laue lens is a lens in which different local gratings from the center of the lens to the outer layer are tilted at the corresponding Bragg angles to fully satisfy the Bragg conditions.

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Abstract

The invention relates to a WSi2 / Al0.98Si0.02 multi-layer film Laue lens used for hard X-ray microfocusing. The multilayer film Laue lens is formed by coating WSi2 layers and metal Al layers doped with 2wt% Si alternately, and has a thickness ratio of 0.5. Compared with the prior art, the design of the new material Laue lens provided by the invention is advantageous in that under a precondition of guaranteeing diffraction efficiency, stress of a film system during a coating process of thousands of film layers is reduced, the interface roughness of the multi-layer film is reduced, filming quality is improved, the caliber and the luminous flux of the Laue lens are effectively increased, and focusing performance is optimized.

Description

technical field [0001] The invention belongs to the research field of precision optical components, and is applied to the development of nanoscale hard X-ray micro-focusing technology, especially relates to a kind of WSi for hard X-ray micro-focusing 2 / Al 0.98 Si 0.02 Multilayer Laue lens. Background technique [0002] X-ray microscopy is widely used in plasma diagnosis, biomedical microscopy and other research fields due to its strong penetrating, short working wavelength, non-destructive measurement, and high sensitivity of elements. The resolution of an X-ray microscopic imaging system is determined by the available focal spot size of its focusing element. Since the refractive index n value of X-rays is close to 1, the diffractive focusing element is more convenient to realize X-ray focusing than the reflection and refraction elements. The traditional diffractive focusing element is a Fresnel zone plate. According to the Rayleigh criterion, the resolution of the Fre...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/00G02B3/00
CPCG02B1/00G02B3/00
Inventor 朱京涛张嘉怡朱圣明冀斌
Owner 苏州闻道电子科技有限公司