Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photosensitive composite thin film material and preparation method and application thereof

A composite film and photosensitive technology, which is applied in the fields of optical recording/reproduction, optical recording carrier manufacturing, optical recording carrier, etc., and can solve problems such as low contrast, low storage density, and slow storage speed

Active Publication Date: 2017-02-15
XIDIAN UNIV
View PDF3 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a photosensitive composite thin film material and its preparation method and application, aiming to solve the problems of low contrast, slow storage speed and low storage density in existing dielectric materials

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive composite thin film material and preparation method and application thereof
  • Photosensitive composite thin film material and preparation method and application thereof
  • Photosensitive composite thin film material and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0047] Such as figure 1 Shown, the preparation method of the photosensitive composite film material of the embodiment of the present invention comprises the following steps:

[0048] S101: Synthesizing multi-metal oxide nanostructures by hydrothermal method;

[0049] S102: Soak the thoroughly cleaned substrate in a polymer solution for a period of time, so that a layer of polymer film is adsorbed on the surface of the substrate;

[0050] S103: immersing the substrate adsorbed with the polymer film in a solution containing multi-metal oxide nanostructures for a period of time to make it adsorb a layer of multi-metal oxide film;

[0051] S104: Repeating S102 and S103 multiple times to prepare the required film composite material.

[0052] Wherein, in the step S101, the multi-metal oxides are tungsten bronze, molybdenum-doped tungsten bronze, hexagonal tungsten trioxide; the nanostructures are nanorods, nanoparticles, nanosheets and the like.

[0053] The polymer used in step ...

Embodiment 1

[0059] Embodiment 1, the preparation of HTB / PEI self-assembled composite color-changing film

[0060] At 80°C, first use Piranha solution (H 2 o 2 :H 2 SO 4 =3:7v / v) The quartz substrate was treated for 30 minutes, and then cleaned with deionized water. Then immerse the substrate in NH 4 OH:H 2 o 2 :H 2 O (1:1:5v / v) solution, treated at 70°C for 30 minutes, then fully washed with deionized water, and blown dry with nitrogen. Wash the cleaned quartz substrate at 10 -2 M Soak in PEI solution (pH=9.0) for 20 minutes to modify PEI on the surface of the substrate. Then the substrate adsorbed with PEI film was immersed in hexagonal tungsten bronze (HTB) nanorods (10 -3 M, pH=3.0) solution, soak for 20 minutes to make it adsorb a layer of HTB nanorods; wash the substrate with ultrapure water, and dry it with nitrogen. The substrate was then immersed in a protonated PEI solution (10 -2 M, pH=3.0) for 20 minutes. Repeat the above steps several times, each time for 20 minut...

Embodiment 2

[0061] Example 2, Mo 0.05 -Preparation of HTB / PEI self-assembled composite color-changing film

[0062] At 80°C, first use Piranha solution (H 2 o 2 :H 2 SO 4 =3:7v / v) The quartz substrate was treated for 30 minutes, and then cleaned with deionized water. Then immerse the substrate in NH 4 OH:H 2 o 2 :H 2 O (1:1:5v / v) solution, treated at 70°C for 30 minutes, then fully washed with deionized water, and blown dry with nitrogen. Wash the cleaned quartz substrate at 10 -2 M Soak in PEI solution (pH=9.0) for 25 minutes to modify PEI on the surface of the substrate. Then the substrate adsorbed with PEI film was immersed in Mo-doped hexagonal tungsten bronze (Mo 0.05 -HTB) nanorods (10 -3 M, pH=3.0) solution, soak for 25 minutes to make it absorb a layer of Mo 0.05 -HTB nanorods; the substrate was washed with ultrapure water and dried with nitrogen gas. The substrate was then immersed in a protonated PEI solution (10 -2 M, pH=3.0) for 25 minutes. Repeat above steps s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
absorbanceaaaaaaaaaa
Login to View More

Abstract

The invention discloses a photosensitive composite thin film material and a preparation method and application thereof. The photosensitive composite thin film material comprises a multi-metal oxide and organic matters. The concentration of the organic polymer solution is in a range of 10<-3> to 10<-2>M. The concentration of the multi-metal oxide is in a range of 10<-3> to 10<-2>M. The preparation method comprises synthesizing a multi-metal oxide nanostructure by a hydrothermal method, immersing a cleaned substrate in a polymer solution so that a layer of the polymer film is adsorbed on the surface of the substrate, immersing the substrate with the polymer film in the solution containing the multi-metal oxide nanostructure so that a layer of the multi-metal oxide film is adsorbed, and repeating the above processes to obtain the desired photosensitive composite thin film material. The photosensitive composite thin film material has a high electron conduction rate, a high light response speed of the material and the photosensitive effects adjusted by change of the doping amount of Mo. The preparation method has the advantages of simple and fast operation. The photosensitive composite thin film material has the characteristics of fast light response and high contrast and has a great application prospect in the fast and accurate information storage.

Description

technical field [0001] The invention belongs to the technical field of film materials, and in particular relates to a photosensitive composite film material and its preparation method and application. Background technique [0002] At present, with the rapid development of information network technology, the amount of information that people have to deal with is increasing day by day, which puts forward higher requirements for the performance of information storage devices, mechanical flexibility, light transparency, light weight, fast response, high contrast storage , low cost has become an important direction for the development of thin film devices in the future. At present, commercial optical disks are mostly magneto-optical recording medium optical disks and phase change medium optical disks. These media use thermal mode to record information, but when the recording point is small, its shape becomes very irregular. Due to thermal diffusion, people have an upper limit on...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08L79/08C08L33/26C08L71/02C08L39/06C08K3/22C08K3/08C08K7/00G11B7/251G11B7/26
CPCC08J5/18C08J2333/26C08J2339/06C08J2371/02C08J2379/08C08K3/08C08K3/22C08K7/00C08K2003/085C08K2003/0887C08K2003/2258C08K2201/011C08L2203/16G11B7/251G11B7/26C08L79/08C08L79/00C08L33/26C08L71/02C08L39/06
Inventor 王忠良张瑞丽贾茜王永东
Owner XIDIAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com