Low-temperature liquid boronizing agent and boronizing process
A technology of low-temperature liquid and boronizing agent, which is applied in metal material coating process, coating, solid diffusion coating and other directions, can solve the problems of high brittleness of boronizing layer, weak bonding of substrate and high boronizing temperature, and achieves a reduction in Effects of boronizing temperature, boron atom activity enhancement, and diffusion rate enhancement
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Embodiment 1
[0026] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 3% of potassium fluoroborate, and 0.5% of cerium chloride. %, the rest is deionized water, and the above percentages are mass percentages;
[0027] (2) Nano-processing the surface of the sample;
[0028] (3) Decontaminate the surface of the nano-sized sample;
[0029] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;
[0030] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.
example 2
[0032] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 2% of potassium fluoroborate, and 0.6% of cerium chloride %, the rest is deionized water, and the above percentages are mass percentages;
[0033] (2) Nano-processing the surface of the sample;
[0034] (3) Decontaminate the surface of the nano-sized sample;
[0035] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;
[0036] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.
Embodiment 3
[0038] The low-temperature boronizing process steps of the present invention are as follows: (1) Weigh the components of the boronizing agent according to the proportion, mix them evenly, and set aside. The proportion of the boronizing agent is 35% of borax, 2.5% of potassium fluoroborate, and 0.55% of cerium chloride %, the rest is deionized water, and the above percentages are mass percentages;
[0039] (2) Nano-processing the surface of the sample;
[0040] (3) Decontaminate the surface of the nano-sized sample;
[0041] (4) Put the boronizing agent and the treated sample into the infiltration tank, seal the infiltration tank, and the material of the infiltration tank is polytetrafluoroethylene;
[0042] (5) Put the seepage tank into the solenoid, heat it with alternating current, control the temperature at 280-320°C, keep it warm for 24 hours, and the pressure inside the seepage tank is 3MPa; cool to room temperature, and take out the sample.
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