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InP crystal growth furnace based on VGF (Vertical Gradient Freeze) method

A crystal growth furnace and furnace wall technology, applied in crystal growth, single crystal growth, single crystal growth, etc., can solve problems such as the influence of temperature distribution stability, and achieve the effect of maintaining stable heating temperature and avoiding interference

Active Publication Date: 2017-03-22
珠海鼎泰芯源晶体有限公司
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Problems solved by technology

[0005] In view of the above problems, the purpose of this invention is to provide a kind of InP crystal growth furnace based on VGF method, to solve the problem of natural convection and heat between two adjacent heating elements. The problem of the influence of radiation on the stability of the temperature distribution in the furnace is conducive to the growth of high-quality InP crystals

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  • InP crystal growth furnace based on VGF (Vertical Gradient Freeze) method
  • InP crystal growth furnace based on VGF (Vertical Gradient Freeze) method
  • InP crystal growth furnace based on VGF (Vertical Gradient Freeze) method

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Embodiment Construction

[0024] The present invention will now be further described in conjunction with the accompanying drawings and specific embodiments, so as to make the present invention clearer and easier to understand.

[0025] image 3 It is a schematic cross-sectional view of a preferred embodiment of the InP crystal growth furnace based on the VGF method of the present invention, as image 3 As shown, the InP crystal growth furnace based on the VGF method of the present invention includes: a furnace base 1, a furnace wall 2, and the furnace base 1 is fixedly connected to the furnace wall 2, and the sealing ring installed at the axial groove of the furnace base 1 form a confined space. A vent 3 is provided on the furnace base 1, and an inert gas is introduced into the furnace through the vent 3 or the cavity is vacuumed to realize the necessary InP crystal growth process conditions. A crucible holder 4 is fixedly connected to the center of the upper surface of the furnace base 1, a crucible...

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Abstract

The invention discloses an InP crystal growth furnace based on a VGF (Vertical Gradient Freeze) method and belongs to the technical field of semiconductor crystal growth equipment. The InP crystal growth furnace disclosed by the invention comprises a furnace base and a furnace wall, wherein a sealed space is formed between the furnace base and the furnace wall; a vent hole is formed in the furnace base; the upper surface of the furnace base is fixedly connected with a crucible support; a crucible is arranged above the crucible support; an isolation barrel without a bottom surface is coaxially arranged on outer sides of the crucible support and the crucible; a plurality of sections of heating elements are arranged at the periphery of the isolation barrel at intervals in the vertical direction; each section of the heating element is fixedly provided with an electrode mounting base; a heating electrode is connected with each heating element through the corresponding electrode mounting base and extends to the outer part of the furnace base; and the bottom of each section of the heating element is fixedly connected with a heater mounting plate. Heat convection and heat radiation between the adjacent heating elements are separated through the heater mounting plate to keep the heating temperature of the heating elements stable.

Description

technical field [0001] The invention relates to the technical field of semiconductor crystal growth equipment, in particular to an InP crystal growth furnace based on a VGF method. Background technique [0002] Indium phosphide (InP) is a III-V compound semiconductor material composed of the group III element indium (In) and the group V element phosphorus (P). It has a very important strategic position in the field of semiconductor materials and is the current optoelectronic device and irreplaceable semiconductor materials for microelectronic devices. Compared with germanium and silicon materials, InP has many advantages: direct transition energy band structure, high electro-optical conversion efficiency; high electron mobility, easy to make semi-insulating materials, suitable for making high-frequency microwave devices and circuits; working temperature High; strong radiation resistance; high conversion efficiency as a solar cell material. Therefore, InP materials are wide...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B11/00C30B29/40
CPCC30B11/00C30B11/003C30B29/40
Inventor 杨翠柏方聪陈丙振
Owner 珠海鼎泰芯源晶体有限公司
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