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A 3D printing photosensitive resin based on photomodulation of graphitic carbon nitride

A phase carbon nitride light, 3D printing technology, applied in the field of 3D printing, can solve the problems of low curing efficiency of 3D printing resin, poor aging resistance, low product precision, etc., to broaden the application market, improve aging resistance and Wear resistance, the effect of improving product accuracy

Active Publication Date: 2019-07-12
YIXING HONGTAI CHEM
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0004] Aiming at the problems of low curing efficiency of UV light curing 3D printing resin, low product precision and poor aging resistance, the present invention provides a g-C based 3 N 4 Light-regulated 3D printing photosensitive resin

Method used

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  • A 3D printing photosensitive resin based on photomodulation of graphitic carbon nitride
  • A 3D printing photosensitive resin based on photomodulation of graphitic carbon nitride
  • A 3D printing photosensitive resin based on photomodulation of graphitic carbon nitride

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Embodiment 1

[0027] components mass percentage Types of supplier Hyperbranched polyester (meth)acrylate 35 UVR-55 Toi Polyurethane (meth)acrylate 10 611A-85 Changxing Modified epoxy (meth)acrylate 5 CN104 Sartoma monofunctional reactive monomer 22.5 IBOA Changxing Hexafunctional reactive monomer 25 EM2696 Changxing Cleavage photoinitiator 3 184 Yingli hydrogen abstraction photoinitiator 3 BP Yingli co-initiator 1 g-C 3 N 4

Embodiment 2

[0029]

Embodiment 3

[0031] components mass percentage Types of supplier Hyperbranched polyester (meth)acrylate 20 UV7M Xinghe Amino(meth)acrylate 10 CN978 Sartoma monofunctional reactive monomer 15 IBOA Changxing Trifunctional Reactive Monomer 25 PET3A Changxing Hexafunctional reactive monomer 20 EM2696 Changxing Cleavage photoinitiator 0.5 1173 Changxing Cleavage photoinitiator 0.5 907 Changxing co-initiator 3 g-C 3 N 4

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Abstract

The invention discloses a 3D printing photosensitive resin based on graphite-phase carbon nitride photocontrol, which consists of 30-50% hyperbranched acrylate resin, 40-60% reactive acrylate monomer, and a main initiator 1 ~8%, co-initiator g‑C 3 N 4 0.5-3%, filler 0.1-10%, auxiliary agent 0.3-2%. The 3D printing photosensitive resin of the present invention is cured under UV irradiation, the curing speed is fast, the tensile strength of the obtained 3D printing material after curing is about 45MPa, the elongation at break is about 14%, the elongation at yield is about 5%, and the elastic modulus About 2600MPa, bending strength about 70MPa, bending modulus about 2200MPa. The 3D printing photosensitive resin is a solvent-free liquid composition, which is non-toxic and environmentally friendly, and has good chemical resistance and wear resistance. The 3D printing equipment can meet different performance requirements. The source of raw materials is wide and the price is low, which is beneficial to broaden its application market.

Description

technical field [0001] The invention belongs to the field of 3D printing, in particular to a g-C based 3 N 4 Light-regulated 3D printing photosensitive resin. Background technique [0002] In recent years, 3D printing technology has developed rapidly. As a "disruptive" technology, the development of its related industries has been promoted to the national strategic level. One of the key technologies of 3D printing is printing material, also called photosensitive resin. Foreign research on 3D printing photosensitive resin started earlier, and the technology is relatively mature, and serialized products have been formed. For example, OBJET of Israel and 3D Systems of the United States occupy most of the 3D printing photosensitive resin market. [0003] In the current practical application in China, most of them also use foreign products. The main reason is that domestic 3D printing materials mainly have the following problems: (1) shrinkage is easy to occur during the cur...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F283/01C08F283/00C08F283/10C08F222/14C08F220/18C08F2/48C08K3/22C08K3/34B33Y70/00
CPCC08F2/48C08F283/006C08F283/01C08F283/105C08K3/22C08K3/34B33Y70/00C08K2201/014C08K2003/2241C08F222/1006C08F220/18C08F222/103
Inventor 怀旭陈朝岚王章忠杭祖圣吴刚强郭猛王冬胜彭叶
Owner YIXING HONGTAI CHEM
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