Vertical continuous electroplating hole filling line
A vertical continuous electroplating and hole line technology, applied in the direction of circuits, semiconductor devices, etc., can solve the problems of weak bonding between the coating and the substrate, uneven coating thickness, uneven appearance of filling holes, etc., and achieve compact structure and good thickness consistency , beautiful appearance effect
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[0029] The specific embodiments of the present invention will be further described below in conjunction with the drawings:
[0030] Such as figure 1 with figure 2 As shown, the vertical continuous electroplating hole-filling line provided by the present invention includes several branch lines arranged in parallel, and is characterized in that: each branch line includes a feeding mechanism 3, a pre-processing device 4, and a forward transfer device connected in sequence 5. Electroplating pretreatment device 58, several levels of electroplating copper cylinder 6, post-transfer device 7, post-processing device 8 and deplating device 9. This embodiment adopts two branch lines of A line and B line arranged in parallel and the above The devices are sequentially connected in a ring shape. Obviously, the hole-filling line can also be distributed in a linear or other form to the devices.
[0031] Such as image 3 with Figure 5 As shown, the pre-processing device 4 includes a feeding mecha...
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