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Process for carrying out low-temperature glass sealing after titanium alloy electrochemical oxidation

A low-temperature glass and titanium alloy technology, used in electrolytic coatings, surface reaction electrolytic coatings, coatings, etc., can solve the problems of insufficient adhesion of oxide films, high sealing temperature, easy to fall off, etc., to achieve superior process consistency and The effect of reproducibility, high bond strength and simple sealing process

Active Publication Date: 2017-05-31
SICHUAN HUAFENG ENTERPRISE GRP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Aiming at the above-mentioned deficiencies in the prior art, the present invention provides a low-temperature glass sealing process after electrochemical oxidation of titanium alloy, which can effectively solve the problem of high sealing temperature in the prior art and the bonding force of the oxide film formed by the titanium alloy before sealing. Not enough, easy to fall off and other problems

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  • Process for carrying out low-temperature glass sealing after titanium alloy electrochemical oxidation

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Embodiment 1

[0023] A low-temperature glass sealing process after electrochemical oxidation of titanium alloy, comprising the following steps:

[0024] (1) After TC4 titanium alloy workpiece is machined, spray glass shot or chemical polishing to remove burrs, etc., and then perform conventional degreasing treatment;

[0025] (2) The softening temperature is 430°C, the sealing temperature is 520°C, and the thermal expansion coefficient is 8.96×10 -6 / (25~300℃), resistivity greater than 10 14 The low-temperature sealing glass of Ω·cm is prepared into a glass gob according to a conventional method;

[0026] (3) At 20°C, use a sulfuric acid solution with a concentration of 180g / L as the electrolyte, the degreased titanium alloy as the anode, and the lead plate as the cathode, and electrolyze for 30 minutes at a DC voltage of 24V to form a titanium alloy surface A uniform blue oxide film;

[0027] (4) Process the inner conductor with semi-hard 4J50, degrease the inner conductor workpiece con...

Embodiment 2

[0033] A low-temperature glass sealing process after electrochemical oxidation of titanium alloy, comprising the following steps:

[0034] (1) After TC4 titanium alloy workpiece is machined, spray glass shot or chemical polishing to remove burrs, etc., and then perform conventional degreasing treatment;

[0035] (2) The softening temperature is 460°C, the sealing temperature is 540°C, and the thermal expansion coefficient is 8.96×10 -6 / (25~300℃), resistivity greater than 10 14 Ω·cm low-temperature sealing glass, which is prepared into a glass gob according to a conventional method;

[0036] (3) At 20°C, use a sulfuric acid solution with a concentration of 180g / L as the electrolyte, the degreased titanium alloy as the anode, and the lead plate as the cathode, and electrolyze for 30 minutes at a DC voltage of 24V to form a titanium alloy surface A uniform blue oxide film;

[0037] (4) Use semi-hard 4J50 to process the inner conductor, degrease the inner conductor workpiece c...

Embodiment 3

[0042] A low-temperature glass sealing process after electrochemical oxidation of titanium alloy, comprising the following steps:

[0043] (1) After TA2 titanium alloy workpiece is machined, spray glass shot or chemical polishing to remove burrs, etc., and then perform conventional degreasing treatment;

[0044] (2) The softening temperature is 450°C, the sealing temperature is 530°C, and the thermal expansion coefficient is 8.96×10 -6 / (25~300℃), resistivity greater than 10 14 Ω·cm low-temperature sealing glass, which is prepared into a glass gob according to a conventional method;

[0045] (3) At 20°C, use a sulfuric acid solution with a concentration of 170g / L as the electrolyte, the degreased titanium alloy as the anode, and the lead plate as the cathode, and electrolyze for 30 minutes at a DC voltage of 23V to form a titanium alloy surface A uniform blue oxide film;

[0046] (4) Use semi-hard 4J50 to process the inner conductor, degrease the inner conductor workpiece c...

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Abstract

The invention discloses a process for carrying out low-temperature glass sealing after titanium alloy electrochemical oxidation. The process comprises the following steps that (1) a titanium alloy is subjected to conventional ungrease treatment; (2) low-temperature sealing glass with the softening temperature ranging from 430 DEG C to 460 DEG C, the sealing temperature ranging from 520 DEG C to 540 DEG C, the thermal expansion coefficient being 8.5-10.0*10<6> / (25-300 DEG C) and the specific resistance being larger than 10<14> omega.cm is selected and prepared into a glass blank according to a conventional method; (3) under the condition of 20 DEG C, a sulfuric acid solution with the concentration ranging from 150 g / L to 200 g / L is used as an electrolyte, the ungreased titanium alloy is used as an anode, a lead plate or a graphite plate is used as a cathode, and electrolytic oxidation is carried out; (4) inner conductor workpiece oxidation is carried out; and (5) glass sealing is carried out. According to the process, the glass sealing temperature range is narrowed, sintering is carried out under the air atmosphere, the sealing process is simple, the cost is low, and the procedure of the process is easy to control.

Description

technical field [0001] The invention belongs to the technical field of titanium alloy glass sealing, and in particular relates to a low-temperature glass sealing process after electrochemical oxidation of titanium alloy. Background technique [0002] Electrical connectors used in space and underwater are usually required to have performances such as airtightness and watertightness. Titanium has the characteristics of seawater corrosion resistance, high specific strength, and non-magnetic properties. It is an ideal ship structural material. A lot of research has been done on the application of titanium in ships at home and abroad. Especially at the end of the 1960s, it reached the stage of actual ship use. For example, the former Soviet Union used titanium to build attacking nuclear submarines. Titanium alloys, the titanium alloys used in my country's ships mainly include TA2, TA3, TA5 and TA4. In addition, many artificial satellites at home and abroad, especially some high-...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/26C03C8/24C03C29/00
CPCC03C8/24C03C29/00C25D11/26
Inventor 张勇强闫军
Owner SICHUAN HUAFENG ENTERPRISE GRP
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