Nanosecond pulse superposition direct current power supply device used for plasma ignition
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
- Publication Date
- 2017-06-27
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to an ignition device, in particular to a nanosecond pulse superimposed DC power supply device for plasma ignition. Background technique
[0002] The plasma generated by nanosecond pulse discharge contains a variety of high-energy particles, with high density, strong activity and high energy, and is widely used in the field of plasma ignition. The power supply device with high discharge energy, integration, and small size plays an important role in promoting the application of plasma ignition.
[0003] Existing plasma ignition devices are limited by many factors. First, the traditional plasma excitation power supply adopts DC or nanosecond pulse power supply. The discharge energy of DC power supply is low and it is difficult to ignite. At a higher value, there is still the problem that the energy of high-energy active particles in the plasma is low or even insufficient to ignite. In addition, many scholars at home and abroad hav...