Preparation method of high-light-transmittance photovoltaic coated glass
A technology of coated glass and high light transmittance, applied in glass manufacturing equipment, glass tempering, manufacturing tools, etc., can solve the problems of uneven film thickness, unsuitable for industrialized large-area coating, and difficult to control the pulling speed.
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Embodiment 1
[0029] Embodiment 1: as attached figure 1 As shown, a photovoltaic coated glass with high light transmittance is provided with an anti-reflection layer 3 on the smooth surface of the glass 1, and an anti-reflection layer 2 is provided on the embossed surface of the glass 1. The anti-reflection layers are all low refraction rate porous silica coating with a thickness of 120 nm.
Embodiment 2
[0030] Embodiment 2: as attached figure 2 As shown, another high-transmittance photovoltaic coated glass is provided with two layers of anti-reflection layers on the smooth surface of glass 1, and one layer of anti-reflection layer 2 is arranged on the embossed surface of glass 1, and its thickness is 110nm. The first anti-reflection layer arranged on the smooth surface is a high-refractive index coating 3 with a thickness of 50nm, and the high-refractive index coating is composed of zirconia and silicon oxide; the second anti-reflection layer arranged on the smooth surface It is a low-refractive-index porous silicon oxide coating 4 provided on the high-refractive-index coating 3, and its thickness is 130 nm.
Embodiment 3
[0031] Embodiment 3: The third kind of high light transmittance photovoltaic coated glass is provided with a layer of anti-reflection layer on the smooth surface of the glass, and a layer of anti-reflection layer is provided on the embossed surface of the glass, and the anti-reflection layers are all low refraction rate porous silica coating with a thickness of 100 nm.
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