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Photosensitive porous polymer film and preparation method thereof

A porous polymer and polymer technology, applied to flat products, other household appliances, applications, etc., can solve the problems of complex photosensitive porous membrane process, and achieve the effect of high recycling rate and low cost

Active Publication Date: 2017-08-04
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] It can be seen that the existing process for preparing a photosensitive porous film is complicated; in addition, there is no photosensitive porous film in the prior art that the porous structure in the porous polymer film disappears after the near-infrared light is illuminated, thereby changing the permeability coefficient of the film. Related reports

Method used

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  • Photosensitive porous polymer film and preparation method thereof
  • Photosensitive porous polymer film and preparation method thereof
  • Photosensitive porous polymer film and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0052] The preparation of embodiment one photosensitive porous polymer film

[0053] The photosensitive porous polymer film is prepared by the following steps:

[0054] (1) Preparation of oxidized carbon nanotubes: carbon nanotubes are oxidized in a mixed solution of nitric acid / hydrochloric acid / water (nitric acid: hydrochloric acid: water = 1:1:1, volume ratio) at 80°C for 4 hours with magnetic stirring and centrifuged to obtain carbon dioxide Nanotubes were washed with distilled water and dried for later use; the mass fraction of carbon nanotubes in the mixture was 0.5wt%, the oxidation temperature was 80°C, and the oxidation time was 4h;

[0055] (2) Preparation of sulfonated carbon nanotubes: add oxidized carbon nanotubes in (1) to obtain a suspension after adding distilled water to ultrasonic for 1 h (the mass fraction of oxidized carbon nanotubes in the resulting suspension is 0.25wt%), and the suspension is added dropwise to The hydrochloric acid solution (in the hydr...

Embodiment 2

[0063] The photosensitive porous polymer film is prepared by the following steps:

[0064] (1) Preparation of oxidized carbon nanotubes: carbon nanotubes are oxidized in a mixed solution of nitric acid / hydrochloric acid / water (nitric acid: hydrochloric acid: water = 1:1:1, volume ratio) at 80°C for 4 hours with magnetic stirring and centrifuged to obtain carbon dioxide Nanotubes were washed with distilled water and dried for later use; the mass fraction of carbon nanotubes in the mixture was 0.5wt%, the oxidation temperature was 80°C, and the oxidation time was 4h;

[0065] (2) Preparation of sulfonated carbon nanotubes: add oxidized carbon nanotubes in (1) to obtain a suspension after adding distilled water to ultrasonic for 1 h (the mass fraction of oxidized carbon nanotubes in the resulting suspension is 0.25wt%), and the suspension is added dropwise to The hydrochloric acid solution (in the hydrochloric acid solution) that contains p-benzenesulfonic acid (the mass fraction...

Embodiment 3

[0077] The photosensitive porous polymer film is prepared by the following steps:

[0078] (1) Preparation of oxidized carbon nanotubes: carbon nanotubes are oxidized in a mixed solution of nitric acid / hydrochloric acid / water (nitric acid: hydrochloric acid: water = 1:1:1, volume ratio) at 80°C for 4 hours with magnetic stirring and centrifuged to obtain carbon dioxide Nanotubes were washed with distilled water and dried for later use; the mass fraction of carbon nanotubes in the mixture was 0.5wt%, the oxidation temperature was 80°C, and the oxidation time was 4h;

[0079](2) Preparation of sulfonated carbon nanotubes: add oxidized carbon nanotubes in (1) to obtain a suspension after adding distilled water to ultrasonic for 1 h (the mass fraction of oxidized carbon nanotubes in the resulting suspension is 0.25wt%), and the suspension is added dropwise to The hydrochloric acid solution (in the hydrochloric acid solution) that contains p-benzenesulfonic acid (the mass fraction ...

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Abstract

The invention relates to a photosensitive porous polymer film and a preparation method of the film and belongs to the field of functional composites. The photosensitive porous polymer film comprises the following ingredients in parts by weight: 70-95 parts of polymer, and 5-30 parts of polyurethane / modified carbon nano tube compound, wherein a mass percentage of a modified carbon nano tube in the polyurethane / modified carbon nano tube compound is 0.1-5%; the modified carbon nano tube refers to a sulfonated carbon nano tube that is subjected to oxidation treatment, rexanthation treatment and final reduction treatment; and the polymer is polyethene or polypropylene. The photosensitive porous polymer film has very good photoresponse, and air permeability of the film can be changed by adjusting a content of a dispersion phase.

Description

technical field [0001] The invention relates to a photosensitive porous polymer film and a preparation method thereof, belonging to the field of functional composite materials. Background technique [0002] Photosensitive porous film is a general term for porous films that have a special response to light, and there are many types of response behaviors, most of which are shrinkage behaviors. Existing reports about the photosensitive porous film are less, and the invention patent with the publication number CN103709300B discloses a photosensitive random copolymer polystyrene-co-polymethacryloxyethyl cinnamate (PS-co- PCEMA), which is prepared from the following raw materials in parts by weight: A component 1, styrene 5-20, azobisisobutyronitrile 0.01-0.05, 1,4 dioxane 5-20, wherein : The parts by weight and proportioning of A component are as follows: hydroxyethyl methacrylate 1, cinnamoyl chloride 1-5, triethylamine 0.5-2, dichloromethane 5-20; the photosensitive random cop...

Claims

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Application Information

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IPC IPC(8): C08L23/08C08L75/04C08K7/24C08K9/00C08K9/02C08K9/04B29D7/01
CPCB29D7/01C08J5/18C08J2323/08C08J2475/04C08L23/0815C08L2203/16C08L75/04C08K7/24C08K9/00C08K9/02C08K9/04
Inventor 杨伟喻鹏黄炎昊包睿莹刘正英杨鸣波
Owner SICHUAN UNIV
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