Method for improving uvioresistant laser damage for fused quartz optical element

A technology for optical components and laser damage, which is applied in the field of optical components, can solve the problems of small effect and low processing efficiency, and achieve the effect of improving surface cleanliness and anti-ultraviolet laser damage performance

Active Publication Date: 2017-08-08
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The efficiency of mid-infrared continuous laser irradiation treatment is low, and the pretreatment of ultraviolet pulsed laser irradiation has l

Method used

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  • Method for improving uvioresistant laser damage for fused quartz optical element

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Embodiment 1

[0031] A method for improving the resistance to ultraviolet laser damage of fused silica optical elements, comprising the following steps:

[0032] Step 1. Ultrasonic cleaning of the fused quartz element with an alkaline solution; the alkaline solution is a KOH solution with a mass fraction of 2%, the ultrasonic frequency of ultrasonic cleaning is 100KHz, and the ultrasonic time is 30min; the fused quartz element is 40*40 *4mm 3 fused silica element (Coring 7980);

[0033] Step 2: Ultrasonic cleaning and drying of the fused silica element after cleaning with the alkaline solution; the resistivity of the high-purity water is 15MΩ.cm, the ultrasonic frequency of ultrasonic cleaning is 100KHz, and the ultrasonic time is 5 minutes;

[0034] Step 3. Put the fused silica element cleaned with high-purity water into the annealing furnace for sub-glass transition temperature heat treatment; set the temperature of the annealing furnace to 900°C, the heating rate to 200°C / h, the heat tr...

Embodiment 2

[0038] A method for improving the resistance to ultraviolet laser damage of fused silica optical elements, comprising the following steps:

[0039]Step 1. Use alkaline solution to ultrasonically clean the fused quartz element; the alkaline solution is a KOH solution with a mass fraction of 5%, the ultrasonic frequency of ultrasonic cleaning is 150KHz, and the ultrasonic time is 60min; the fused quartz element is 40*40 *4mm 3 fused silica element (Coring 7980);

[0040] Step 2. Ultrasonic cleaning and drying of the fused silica element after cleaning with the alkaline solution; the resistivity of the high-purity water is 15MΩ.cm, the ultrasonic frequency of ultrasonic cleaning is 150KHz, and the ultrasonic time is 10min;

[0041] Step 3. Put the fused silica element cleaned with high-purity water into the annealing furnace for sub-glass transition temperature heat treatment; set the temperature of the annealing furnace to 900°C, the heating rate to 400°C / h, the heat treatment ...

Embodiment 3

[0045] A method for improving the resistance to ultraviolet laser damage of fused silica optical elements, comprising the following steps:

[0046] Step 1. Use alkaline solution to ultrasonically clean the fused quartz element; the alkaline solution is a KOH solution with a mass fraction of 3%, the ultrasonic frequency of ultrasonic cleaning is 120KHz, and the ultrasonic time is 30min; the fused quartz element is 40*40 *4mm 3 fused silica element (Coring 7980);

[0047] Step 2: The fused silica element cleaned by the alkaline solution is ultrasonically cleaned with high-purity water, and dried; the resistivity of the high-purity water is 15MΩ.cm, the ultrasonic frequency of ultrasonic cleaning is 120KHz, and the ultrasonic time is 5min;

[0048] Step 3. Put the fused silica element cleaned with high-purity water into the annealing furnace for sub-glass transition temperature heat treatment; set the temperature of the annealing furnace to 900°C, the heating rate to 600°C / h, th...

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Abstract

The invention discloses a method for improving uvioresistant laser damage for fused quartz optical element, comprising: using an alkaline solution to perform ultrasound cleaning on the fused quartz element; using ultrapure water to perform ultrasound cleaning on the fused quartz element cleaned by the alkaline solution, and drying the same; performing secondary vitrification conversion temperature heating treatment on the fused quartz element cleaned by the ultrapure water; and performing dynamic acid etching and drying on the fused quartz element after the heat treatment. The invention achieves the purposes of eliminating the structural defects of the fused quartz and improving uvioresistant laser damage for fused quartz by controlling parameters such as the temperature and the time of the secondary vitrification conversion temperature heating treatment, frequency of the dynamic acid etching sound field, solution concentration, and etching time, so as to meet running requirements of solid laser device with high power.

Description

technical field [0001] The invention belongs to the technical field of optical elements, and in particular relates to a method for improving the damage resistance of fused silica optical elements to ultraviolet laser damage. Background technique [0002] Fused silica is the most commonly used optical material in large-scale high-power laser drive systems. Fused silica materials are widely used in optical systems to prepare optical components such as lenses, windows, and shielding sheets. During the processing (polishing, grinding, etc.) of fused silica components, surface and subsurface defects such as impurities and scratches will inevitably be introduced. When the component is exposed to high-intensity laser radiation, these defects will absorb laser energy violently, resulting in a series of irreversible and catastrophic laser-induced damage on the surface of the component and inside the material, that is, when the sum of the damage point area exceeds a certain proportion...

Claims

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Application Information

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IPC IPC(8): C03C23/00C03B32/00C03C15/00
Inventor 陈静张丽娟蒋一岚张传超廖威杨科蒋晓龙白阳王海军栾晓雨袁晓东
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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