Hydration-resistant magnesite-calcium refractory material and preparation method thereof
A refractory material, magnesium-calcium technology, applied in the field of hydration-resistant magnesium-calcium refractory materials and its preparation, can solve problems such as affecting product quality, loss of hydration resistance, and easy damage to organic coatings, so as to improve water resistance Chemical performance, beneficial to industrial production and application, and prolonging the service life
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Embodiment 1
[0019] Select sintered magnesia-calcium sand with a particle size of 3 mm, put it into the vacuum chamber of a vacuum ion coating machine, and use DC reactive magnetron co-sputtering. The independent metal aluminum is used as the target, and the independent DC power supply is used for power supply, Ar is used as the glow gas, O 2 as a reactive gas. When the back vacuum is better than 2×10 -3 After Pa, clean with Ar plasma bombardment for 15 min in the sputtering chamber. Control Ar / O 2 =120 / 30 (flow ratio), total pressure 0.4Pa, target-base distance 100mm, base bias voltage -80V. The aluminum target was deposited for 30 min under the condition that the sputtering power of the aluminum target was 6000 W.
Embodiment 2
[0021] Select sintered magnesia-calcium sand with a particle size of 2 mm, put it into the vacuum chamber of a vacuum ion coating machine, and use DC reactive magnetron co-sputtering. The independent metal aluminum is used as the target, and the independent DC power supply is used for power supply, Ar is used as the glow gas, O 2 as a reactive gas. When the back vacuum is better than 7×10 -3 After Pa, clean with Ar plasma bombardment for 15 min in the sputtering chamber. Control Ar / O 2 =50 / 30 (flow ratio), total pressure 1.5Pa, target-base distance 50mm, base bias voltage -80V. The aluminum target was deposited for 90 min under the condition that the sputtering power of the aluminum target was 230W.
Embodiment 3
[0023] Select sintered magnesia-calcium sand with a particle size of 12 mm, put it into the vacuum chamber of a vacuum ion coating machine, and use DC reactive magnetron co-sputtering. The independent metal aluminum is used as the target, and the independent DC power supply is used for power supply, Ar is used as the glow gas, O 2 as a reactive gas. When the back vacuum is better than 7×10 -3 After Pa, clean with Ar plasma bombardment for 15 min in the sputtering chamber. Control Ar / O 2 =100 / 30 (flow ratio), total pressure 1.5Pa, target-base distance 50mm, base bias voltage -80V. The aluminum target was deposited for 60 min under the condition that the sputtering power of the aluminum target was 400 W.
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