Side edge coupling raster of laser and preparation method for raster, and laser comprising raster
A technology for coupling gratings and lasers, applied in the field of semiconductor technology and nanofabrication, can solve problems such as insufficient exposure and stacking, and achieve the effects of reducing costs, reducing time, and accurately and controllable exposure areas.
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[0035] According to the general inventive concept of the present invention, a method for preparing a side coupling grating of a laser is provided, that is, the first electron beam exposure pre-lithography is performed on the epitaxial wafer carved with ridge waveguides, and then the layout and pattern are observed by SEM. The distance error of the ridge-stripe waveguide, and then correct the grating layout, perform formal grating exposure, and then perform metal sputtering and stripping to complete the preparation of the metal grating.
[0036] The laser ridge-stripe waveguide is formed by dry etching, preferably using an ICP etching system. Preferably, the width of the ridge-stripe waveguide is 3-5 μm. As for the position of the grating, since the distance of about 2 μm on both sides of the ridge waveguide is the effective area of the grating, when designing the grating, the overall width is designed to be 2 to 3 μm on both sides of the ridge waveguide.
[0037] For the pro...
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