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Method for optimizing monocrystalline-silicon pyramid-structured textured face

A technology of pyramid structure and optimization method, which is applied in the field of alkali texturing process, can solve the problem of low conversion efficiency improvement, achieve the effect of improving uniformity, conversion efficiency and cleaning effect

Inactive Publication Date: 2018-02-09
DONGFANG HUANSHENG PHOTOVOLTAIC (JIANGSU) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Through practice, it can be seen that the improvement of conversion efficiency is low

Method used

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  • Method for optimizing monocrystalline-silicon pyramid-structured textured face

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Embodiment 1, a kind of optimization method of monocrystalline silicon pyramid structure suede, concrete steps are:

[0026] Step (1) Add deionized water, hydrofluoric acid and hydrochloric acid into the pickling tank of the alkali texturing equipment, the weight-to-number ratio of the three is 6:1:3, start bubbling, and mix the solution for 5 minutes;

[0027] Step (2) the ozone produced by the ozone generator is fed into the circulation pump, and then pumped into the pickling tank by the circulation pump;

[0028] Step (3) Put the textured monocrystalline silicon wafer into the pickling tank, start bubbling, and keep it in the tank for 2mins, and complete subsequent washing, hot water slow pulling, and drying;

[0029] Among them, the ozone flow rate was maintained at 50L / min for 15 minutes before the monocrystalline silicon wafer was placed in the pickling tank, and the ozone flow rate was maintained at 15L / min during the process of placing the monocrystalline silico...

Embodiment 2

[0031] Embodiment 2, a kind of optimization method of monocrystalline silicon pyramid structure suede, concrete steps are:

[0032] Step (1) Add deionized water, hydrofluoric acid and hydrochloric acid into the pickling tank of the alkali texturing equipment, the weight-to-number ratio of the three is 6:1:3, start bubbling, and mix the solution for 10 minutes;

[0033] Step (2) the ozone produced by the ozone generator is fed into the circulation pump, and then pumped into the pickling tank by the circulation pump;

[0034] Step (3) Put the monocrystalline silicon wafer that has been textured into the pickling tank, start bubbling, and keep it in the tank for 5mins, and complete the subsequent washing, hot water slow pulling, and drying;

[0035] Among them, the ozone flow rate was maintained at 70L / min for 15 minutes before the monocrystalline silicon wafer was placed in the pickling tank, and the ozone flow rate was maintained at 35L / min during the process of placing the mon...

Embodiment 3

[0037] Embodiment 3, a kind of optimization method of monocrystalline silicon pyramid structure suede, concrete steps are:

[0038] Step (1) Add deionized water, hydrofluoric acid and hydrochloric acid into the pickling tank of the alkali texturing equipment, the weight-to-number ratio of the three is 6:1:3, start bubbling, and mix the solution for 8 minutes;

[0039] Step (2) the ozone produced by the ozone generator is fed into the circulation pump, and then pumped into the pickling tank by the circulation pump;

[0040] Step (3) Put the textured monocrystalline silicon wafer into the pickling tank, start bubbling, and keep it in the tank for 4mins, and complete subsequent washing, hot water slow pulling, and drying;

[0041] Among them, the ozone flow rate was maintained at 60L / min for 15 minutes before the monocrystalline silicon wafer was put into the pickling tank, and the ozone flow rate was kept at 25L / min during the process of putting the monocrystalline silicon wafer...

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Abstract

The invention discloses a method for optimizing a monocrystalline-silicon pyramid-structured textured face. The method is characterized in that ozone gas is introduced into a pickling acid mixing tankof alkali texturing equipment, thus, the flow rate of ozone can be controlled in an ozone introducing manner so as to effectively control the content of ozone in the tank and better achieve an oxidation action, and meanwhile, the acid mixing tank plays a role in neutralizing residual alkali and removing metal ions. According to the method, the ozone of certain concentration is introduced into thepickling acid mixing tank of the alkali texturing equipment, thus, the action of neutralizing the residual alkali and removing the metal ions of the traditional pickling tank can be exerted, and a microstructure of a monocrystalline pyramid textured face can be optimized. Thus, the uniformity of a diffused PN junction and the uniformity of sheet resistance can be effectively improved, the effectof cleaning organic matters and metal ions from surfaces of silicon wafers is improved, the front face passivating effect is improved, and thus, the conversion efficiency of cell sheets is increased.

Description

technical field [0001] This patent belongs to the field of photovoltaic technology, and specifically relates to the alkali texturing process in the manufacturing process of single crystal solar cells. Background technique [0002] In recent years, with the continuous development of solar cell technology, not only the efficiency of cells in the research field has continuously broken through and hit new highs, but also in industrial production, the production scale of solar cells has also continued to expand. In order to obtain higher conversion efficiency and reduce production costs, technicians in the solar energy industry continue to innovate the process technology, which gradually reduces the photovoltaic on-grid electricity price, and finally gradually replaces fossil energy. [0003] Texturing the surface of monocrystalline silicon solar cells is one of the key technologies for producing high-efficiency monocrystalline silicon solar cells, which is conducive to reducing ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10C30B29/06H01L31/18H01L31/0236
CPCC30B29/06C30B33/10H01L31/02363H01L31/1804Y02P70/50
Inventor 吴俊清樊华贾泰从海泉
Owner DONGFANG HUANSHENG PHOTOVOLTAIC (JIANGSU) CO LTD
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