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Rectangular glass substrate and method for preparing the same

一种玻璃基板、制造方法的技术，应用在制造工具、半导体/固态器件制造、适用于磨削工件边缘的机床等方向，能够解决缺损、配线短路等问题，达到抑制制造成品率的降低、抑制表面污染的效果

Active Publication Date: 2018-03-09
SHIN ETSU CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If residues in the polishing process of the glass substrate or contamination in the cleaning process, dirt, or particles adhere to the surface of the glass substrate to form a film, it may cause short circuits or chipping in wiring during patterning.

Method used

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  • Rectangular glass substrate and method for preparing the same
  • Rectangular glass substrate and method for preparing the same
  • Rectangular glass substrate and method for preparing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0088] 100 raw material substrates of cut square synthetic quartz glass with an outer dimension of 152 mm were prepared, the front and back sides were ground, and then side and chamfered surfaces were ground with a diamond wheel (800 mesh). Next, use a brush with a wire diameter of 60 μm, a base diameter of 200 mm, a length of 150 cm, a hair body length of 20 mm, and a density of 3 hairs / mm 2 A nylon brush and a cerium oxide-based abrasive (A-10, manufactured by Showa Denko Co., Ltd.) were used to perform side mirror-finishing on one side surface for 5 minutes on a total of 4 surfaces to form a side surface and a chamfered surface shape. Specifically, 100 glass substrates were stacked at a stacking interval of 500 μm (8.3 times the wire diameter of the bristles of the brush), and the bristles were arranged so as to touch the sides of the substrates at a depth of about 8 mm from the bristles of the bristles. For the brush, the brush was rotated at a rotational speed of 1000 rpm...

Embodiment 2

[0097] In the same manner as in Example 1, 100 raw material substrates of cut square synthetic quartz glass with an outer dimension of 152 mm were prepared, and after grinding, side and chamfered surface grinding, a brush made of nylon with a wire diameter of 60 μm was used. Brushes and cerium oxide-based abrasives were used on a total of four surfaces to perform side mirror-finishing for one side surface for 5 minutes, thereby forming a side surface and a chamfered surface shape. At this time, the stacking interval of the rectangular synthetic quartz glass substrates was 200 μm (3.3 times the wire diameter of the bristles of the brush).

[0098] At the time when the mirror-finishing of the side surface was completed, the plate thickness was about 6.45 mm. Random 10 sheets were selected from 100 sheets in the same manner as in Example 1, and the shape of the chamfered surface and its vicinity was measured. As a result, the first curved surface from the surface to the position ...

Embodiment 3

[0105] In the same manner as in Example 1, 100 raw material substrates of cut square synthetic quartz glass with an outer dimension of 152 mm were prepared, and after grinding, side and chamfered surface grinding, a brush made of nylon with a wire diameter of 60 μm was used. Brushes and cerium oxide-based abrasives were used on a total of four surfaces to perform side mirror-finishing for one side surface for 5 minutes, thereby forming a side surface and a chamfered surface shape. At this time, the stacking interval of the rectangular synthetic quartz glass substrates was 200 μm (3.3 times the wire diameter of the bristles of the brush).

[0106] Then, a fixed plate with a diameter of 300 mm covered with a polishing cloth was brought into contact with the side surface to perform polishing. Paste the hard polyurethane liner on the fixed plate, make the rotation speed 70rpm, and make the grinding pressure 150gf / cm 2 , and polished using cerium oxide (A-10, manufactured by Showa...

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PUM

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Abstract

The invention relates to a rectangular glass substrate and a method for preparing the same. The rectangular glass substrate which has a front surface, a back surface, four side surfaces, and eight chamfered surfaces, and a thickness of at least 6 mm. A first curved surface along the edge line between the front surface and the chamfered surface disposed adjacent thereto has an average gradient of up to 25% in a range from the front surface to a position of 50 [mu]m below the front surface when the substrate is rested horizontal with the front surface facing upward. A second curved surface alongthe edge line between at least one of four side surfaces and the chamfered surface disposed adjacent to the front surface has an average gradient of at least 30% in a range from the at least one sidesurface to a position of 50 [mu]m below the at least one side surface when the substrate is rested horizontal with the at least one side surface facing upward.

Description

technical field [0001] The present invention relates to square glass substrates mainly used in semiconductor-related electronic materials, especially synthetic quartz glass substrates for cutting-edge photomasks, square glass substrates used in nanoimprinting, and their manufacturing methods. Background technique [0002] The types of defects on the glass substrate include convex defects such as dirt and firmly attached particles, in addition to defects classified into damage such as pits and scratches. If residues in the polishing process of the glass substrate or contamination in the cleaning process, dirt, and particles adhere to the surface of the glass substrate to form a film, it may cause a short circuit or a chip in the wiring during patterning. Therefore, it is important to remove dirt and particles in the cleaning step of the glass substrate. [0003] For example, in Patent Document 1 (Japanese Unexamined Patent Publication No. 11-109607), in order to prevent crac...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B9/10
CPCB24B9/10B24B29/005B24B9/005C03C3/06C03C23/0075C03C19/00C03C4/00B24B7/242C03C21/00H01L21/02422H01L29/06
Inventor 原田大实竹内正树
Owner SHIN ETSU CHEM CO LTD
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