A device and method for removing uranium hexafluoride contamination from a measuring sensor

A technology for measuring sensors and uranium hexafluoride, used in radioactive purification, nuclear engineering, etc., can solve the problems of out-of-control measurement standards, adverse effects on the environment, and expansion of the scope of influence of operators, so as to reduce the possibility of contamination and reduce The generation of waste liquid, the effect of avoiding adverse effects

Active Publication Date: 2020-08-21
CNNC LANZHOU URANIUM ENRICHMENT
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Problems solved by technology

The volatilized materials pollute the test equipment and the standard meter used for verification, and the polluted standard meter cannot be sent to the superior verification department for traceability, resulting in loss of control of the measurement standard, sensor verification, calibration and other work cannot be carried out, and the measurement value is meaningless. Ensure that the sensor tests used in on-site measurements are true and effective
[0004] In addition, the radioactive materials remaining in the measuring instrument are transported along with the instrument, and the verification, calibration, and traceability of the standard table to the superior verification unit cause the spread of radioactive materials, expand the scope of influence on the operators, and may also affect the environment. adversely affect

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  • A device and method for removing uranium hexafluoride contamination from a measuring sensor
  • A device and method for removing uranium hexafluoride contamination from a measuring sensor
  • A device and method for removing uranium hexafluoride contamination from a measuring sensor

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Embodiment Construction

[0042] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0043] A device for removing uranium hexafluoride contamination from measuring sensors, capable of simultaneously cleaning three or less than three uranium hexafluoride measuring sensors, the three uranium hexafluoride measuring sensors are respectively set as a sensor to be decontaminated 2. The second sensor to be decontaminated 3 and the third sensor to be decontaminated 4, the device includes a main pipe, a branch pipe, a connecting pipe, a pressure monitoring and measuring instrument 1, a nitrogen cylinder 5, a pressure reducing valve 6 and a buffer tank 7.

[0044] The pressure monitoring and measuring instrument 1 is connected to the main pipe, and three branch points are successively arranged on the main pipe at the rear of the pressure monitoring and measuring instrument 1, each of which leads to a connecting pipe through the ...

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Abstract

The invention relates to the technical field of radioactive waste treatment, and particularly discloses a device and method for removing a uranium hexafluoride pollutant from a measuring sensor. The device includes a dry pipe, a branch pipe led out from the dry pipe, a pressure monitoring and measuring instrument connected to the dry pipe, a buffer tank connected to the dry pipe through a connecting pipe, and a nitrogen bottle connected to the buffer tank through a pressure reducing valve. The decontamination method includes the following steps of step one: pumping; step two: venting; step three: heating; step four: exhausting; and step five: repeating step one to four for several times. By using the device and method for decontamination, the effect is obvious, after the decontamination, the radioactive content of residual materials is far lower than the national standard and meets the requirements of measurement instruments for performing verification.

Description

technical field [0001] The invention belongs to the technical field of radioactive waste treatment, and in particular relates to a device and a method for removing uranium hexafluoride contamination from a measurement sensor. Background technique [0002] In the uranium isotope centrifugal separation cascade process, a large number of pressure measurement, light impurity protection sensors, light impurity relative measurement sensors, light impurity absolute measurement sensors, UF6 gas flow protection sensors and other measuring equipment are used to protect the production process . [0003] Since the UF6 gas measurement sensor is in direct contact with the process medium during use, some materials will still remain in the cavity of the sensor even though it is purged before disassembly. Since the sensor works under absolute pressure, that is, 0 ~ 13.3kPa, when the sensor is disassembled for maintenance, testing, verification and calibration, etc., it needs to be evacuated...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21F9/30
CPCG21F9/30
Inventor 杨春林闫金锁刘中明王玉奎权娜娜
Owner CNNC LANZHOU URANIUM ENRICHMENT
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