Lateral power device with mixed conduction mode and method of making same
A lateral power device and mode technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electro-solid devices, etc., can solve the problems of low on-state voltage drop, reduced device loss characteristics, large turn-off loss, etc. Manufacturing difficulty, reducing turn-off loss, and improving the effect of breakdown voltage
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Embodiment 1
[0041] A transverse power device with mixed conduction mode, the cell structure and the cross-sectional view along line AA’ are as follows: figure 2 and image 3 As shown, it includes a P-type substrate 1, a buried oxide layer 2, and an N-type drift region 3 arranged in order from bottom to top; one end of the N-type drift region 3 is provided with a P-type base region 4, and the other end is provided with an N-type Buffer area 8; the P-type base region 4 is provided with an N-type source region 5 and a P-type contact region 6 above the interior, and the N-type buffer region 8 is provided with a P-type collector region 9 above the interior; the P-type contact There is an emitter 10 above the region 6 and part of the N-type source region 5; a part of the upper surface of the P-type collector region 9 has a collector 12; a gate dielectric layer 7 is also provided above the P-type base region 4. There is a gate electrode 11 above the dielectric layer 7. The length of the gate stru...
Embodiment 2
[0050] Such as Figure 4 with Figure 5 As shown, the difference between this embodiment and Embodiment 1 is that there is an N-type layer 18 between the N-type strip 13, P-type strip 14 and the P-type RESURF layer 16, and the concentration of the N-type layer 18 is greater than The concentration of the N-type drift region 3. Compared with Embodiment 1, this embodiment can further improve the current conduction capability of the lateral MOSFET.
Embodiment 3
[0052] Such as Image 6 As shown, the difference between this embodiment and Embodiment 1 is that the P-type RESURF layer 16 is composed of a first sub-region 161, a second sub-region 162, and a third sub-region 163 whose concentrations decrease from left to right. Compared with Embodiment 1, this embodiment can further increase the breakdown voltage of the device.
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