Aluminum-scandium alloy target blank and preparation method and application thereof

A kind of alloy target, aluminum-scandium technology, applied in the field of aluminum-scandium alloy target blank and its preparation

Inactive Publication Date: 2018-03-27
GEMCH MATERIAL TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the content of scandium in the aluminum-scandium alloy target blanks prepared by the traditional method is l

Method used

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Examples

Experimental program
Comparison scheme
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Example Embodiment

[0038] The invention also provides a method for preparing an aluminum-scandium alloy target blank.

[0039] A method for preparing an aluminum-scandium alloy target blank, comprising the steps of:

[0040] S1. Take scandium powder and aluminum powder with a particle size in the range of 20-100 μm, and perform cold isostatic pressing on the scandium powder and aluminum powder according to the proportion.

[0041] Wherein, the mass ratio of scandium powder to the aluminum powder is 16-50:50-84.

[0042] Among them, the purity of aluminum metal is 99.99%, and the purity of scandium metal is 99.99%.

[0043] Preferably, scandium powder and aluminum powder can be selected by first ball milling and then sieving to obtain powders with a particle size in the range of 20-100 μm. The main function of the ball mill is to fully grind the aluminum powder and scandium powder, and refine the grain size of the aluminum powder and scandium powder.

[0044] More preferably, the ball milling ...

Example Embodiment

[0071] Example 1

[0072] 3360g of aluminum metal powder with a purity of 99.99% and 640g of scandium metal powder with a purity of 99.99% were selected and added to a ball mill for ball milling for 4 hours. Then, sieve the aluminum-scandium mixed powder whose particle size is less than or equal to 48 μm.

[0073] Put the ball-milled aluminum-scandium mixed powder into a mould, then put it into a cold isostatic press under a pressure of 120 MPa for cold isostatic pressing, and demould to obtain an alloy blank. Then the alloy blank is vacuum sintered in a sintering furnace at a vacuum degree of 0.05 Pa by adopting staged heating. Among them, the staged heating process is: first raise the temperature to 800°C at a rate of 100°C / h, and hold for 2 hours; then raise the temperature to 1000°C at a rate of 200°C / h, and hold for 4 hours. Then the alloy blank after vacuum sintering was cooled down to room temperature at a rate of 100°C / h, and then machined to obtain an aluminum-scand...

Example Embodiment

[0075] Example 2

[0076] 2680g of aluminum metal powder with a purity of 99.99% and 1320g of scandium metal powder with a purity of 99.99% were selected and added to a ball mill for ball milling for 4 hours. Then, sieve the aluminum-scandium mixed powder whose particle size is less than or equal to 61 μm.

[0077] Put the ball-milled aluminum-scandium mixed powder into a mould, then put it into a cold isostatic pressing machine under a pressure of 200 MPa for cold isostatic pressing, and demould to obtain an alloy blank. Then, the alloy blank is vacuum sintered in a sintering furnace at a vacuum degree of 0.08 Pa by adopting staged heating. Among them, the staged heating process is: first raise the temperature to 820°C at a rate of 150°C / h, and hold for 3 hours; then raise the temperature to 1100°C at a rate of 300°C / h, and hold for 10 hours. Then the vacuum sintered alloy blank was cooled down to room temperature at a rate of 80°C / h, and then machined to obtain an aluminum...

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Abstract

The invention relates to an aluminum-scandium alloy target blank and a preparation method and application of the aluminum-scandium alloy target blank. The aluminum-scandium alloy target blank comprises, by weight, 16-50 parts of scandium and 50-84 parts of aluminum. The oxygen content of the aluminum-scandium alloy target blank is smaller than or equal to 160 ppm. The aluminum-scandium alloy target blank is high in scandium content and low in oxygen content, so that the prepared target blank cannot generate abnormal discharge or particle sputtering scars, and follow-up high-quality firm formation can be guaranteed.

Description

technical field [0001] The invention relates to the field of aluminum-scandium alloy materials, in particular to an aluminum-scandium alloy target blank and its preparation method and application. Background technique [0002] Sputtering is required to form aluminum-scandium alloys in many occasions, for example, in the preparation process of micro-electromechanical systems (MEMS) integrating micro-sensors, actuators, signal processing and control circuits, interface circuits, communications and power supplies. Generally, an aluminum-scandium alloy target blank is used as a sputtering source to form an aluminum-scandium alloy by sputtering. [0003] At present, the content of scandium in the aluminum-scandium alloy target blanks prepared by the traditional method is less than 10%, and the aluminum-scandium alloy target blanks with a scandium content of more than 10% have not been reported yet. Contents of the invention [0004] Based on this, it is necessary to provide an...

Claims

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Application Information

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IPC IPC(8): C22C1/04C22C21/00C23C14/14C23C14/34
CPCC22C21/00C22C1/0416C23C14/14C23C14/3414
Inventor 程银兵庄志杰顾宗慧庄猛
Owner GEMCH MATERIAL TECH SUZHOU
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