A Method for Reducing Residual Stress of Tetrahedral Amorphous Carbon Film for Optical Window
A technology of tetrahedral amorphous carbon and optical windows, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problems of large residual stress of the film, poor environmental adaptability, and hindering application fields, etc., and achieve stress The regulation method is simple and effective, the regulation process is simple, and the optical properties are not affected
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0031] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0032] An embodiment of the present invention provides a method for reducing the residual stress of a tetrahedral amorphous carbon film for an optical window. The method is: quickly put the prepared substrate into a vacuum chamber, and the working gas is argon with a purity of 99.999%; The vacuum chamber is pumped to a vacuum degree of 5.0×10 by a mechanical pump and a molecular pump. -4 Pa, after X time, the vacuum degree is controlled to be 5.0×10 -2Pa, film deposition is carried out on the substrate through the target material, and at the same time, the stress control of the tetrahedral amorpho...
PUM
Property | Measurement | Unit |
---|---|---|
infrared transmittance | aaaaa | aaaaa |
infrared transmittance | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com