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Preparation method of low-friction-coefficient MoS2 base metal-oxide composite solid lubrication film

A low friction coefficient, solid lubrication technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problem of reducing the shear strength of solid lubrication film, poor repeatability of dry lubrication film process, dry lubrication Low film-substrate bonding force and other problems, to achieve good anti-friction effect, excellent wear resistance and low processing cost

Inactive Publication Date: 2018-03-27
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the repeatability of the process for preparing the dry lubricating film in this patent is not good, it is not easy to automate, and the film is not easy to be deposited uniformly, and defects such as melting droplets will appear, and the film-base bonding force of the dry lubricating film is low, and the shearing of the film high strength
[0011] Therefore, in order to improve the oxidation resistance and moisture resistance of molybdenum disulfide, improve the lubrication, wear resistance and moisture resistance and oxidation resistance of the film, improve the film-base bonding force of the solid lubricating film, and reduce the shear strength of the solid lubricating film, To solve the problem of poor wear resistance of molybdenum disulfide-based solid lubricating film in use and harsh use environment, it is necessary to provide a low friction coefficient MoS 2 The preparation method of the base multi-component composite solid lubricating film, in order to provide the possibility of using the molybdenum disulfide-based film in multiple occasions, and prolong the service life of the film

Method used

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  • Preparation method of low-friction-coefficient MoS2 base metal-oxide composite solid lubrication film

Examples

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Embodiment 1

[0052] A low friction coefficient MoS 2 Preparation method of base metal-oxide composite solid lubricating film

[0053] (1) Carry out surface polishing, acetone and alcohol ultrasonic cleaning to monocrystalline silicon substrate, after drying, set aside;

[0054] (2) Set the sputtering process parameters: the background vacuum is 5×10 -4 Pa, the working pressure is: Ar protective gas, 0.5Pa pressure, the substrate temperature is normal temperature, the substrate rotation speed is 0.05r / s, and the target-base distance is 17cm;

[0055] (3) Preparation of composite solid lubricating film: through Ti metal target and ZnO target, MoS 2 The target is co-sputtered under the process parameters of step (2) to prepare a composite solid lubricating film, wherein the Ti metal target uses a DC sputtering target power supply with a power of 10W, and the ZnO target uses a 50W RF sputtering target power supply, MoS 2 The target material uses a 100W RF sputtering target power supply, and...

Embodiment 2

[0057] A low friction coefficient MoS 2 Preparation method of base metal-oxide composite solid lubricating film

[0058] (1) Carry out surface polishing, acetone and alcohol ultrasonic cleaning to monocrystalline silicon substrate, after drying, set aside;

[0059] (2) Set the sputtering process parameters: the background vacuum is 5×10 -4 Pa, the working pressure is: Ar protective gas, 0.5Pa pressure, the substrate temperature is normal temperature, the substrate rotation speed is 0.05r / s, and the target-base distance is 15cm;

[0060] (3) Preparing the pre-bonding layer film: using a Ti metal target to pre-sputter on the substrate to prepare the pre-bonding layer film for 10 minutes, the pre-sputtering power is a DC sputtering target power supply of 100W, and the thickness of the pre-bonding layer film is 30nm;

[0061] (4) Preparation of composite solid lubricating film: through Ti metal target and ZnO target, MoS 2 The target is co-sputtered on the basis of the pre-bond...

Embodiment 3

[0066] A low friction coefficient MoS 2 Preparation method of base metal-oxide composite solid lubricating film

[0067] The preparation method of the composite solid lubricating film was the same as in Example 2 except that the Ti metal target used a DC sputtering target power supply with a power of 25W when preparing the composite solid lubricating film, and the thickness of the obtained composite solid lubricating film was 2.5 μm.

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Abstract

The invention discloses a preparation method of a low-friction-coefficient MoS2 base metal-oxide composite solid lubrication film. The preparation method comprises a step of preparing a composite solid lubrication film, a step of preparing a pre-binding layer film on a substrate through pre-sputtering before preparation of the composite solid lubrication film, and a step of preparing a transitionlayer film after preparation of the pre-binding layer film and before preparation of the composite solid lubrication film. The problems of weaker wear resistance and harsh use environment of a molybdenum disulfide base solid lubrication film are solved; and the preparation method of the low-friction-coefficient MoS2 base metal-oxide composite solid lubrication film provides possibility of using molybdenum disulfide base films in multiple places, and prolongs the service life of the films.

Description

technical field [0001] The invention relates to the field of metal coating, in particular to a low friction coefficient MoS 2 A method for preparing a base metal-oxide composite solid lubricating film. Background technique [0002] Solid lubricating film can be used in occasions where the use of lubricating grease is limited, the environment is harsh, and no maintenance is required. It is commonly used in space technology, electrical engineering, and automotive engineering. [0003] Physical vapor deposition technology refers to the technology of using physical methods to vaporize the surface of material sources into gaseous atoms, molecules or parts into ions under vacuum conditions, and deposit a thin film with a certain special function on the surface of the substrate. Physical vapor deposition technology is mainly divided into vacuum evaporation deposition technology, sputtering deposition technology and ion coating technology. At present, magnetron sputtering coating ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/16
CPCC23C14/0688C23C14/165C23C14/352
Inventor 王文权曹明刘亮
Owner JILIN UNIV