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A silicon wafer detection method and a silicon wafer detection device

A detection method and technology of silicon wafers, which are applied in the field of solar cells, can solve the problems of no uniform standards for detection methods, inconsistent subjective judgment standards, poor appearance evaluation effects, etc., and achieve high repeatability, fast speed, and high precision.

Active Publication Date: 2021-07-20
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the reflectance measurement value of each point is the average value of a small area, the evaluation effect on the appearance is poor, and the subjective judgment standards of different technicians are not uniform, so there is currently no uniform standard for the detection method of the appearance of silicon wafers

Method used

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  • A silicon wafer detection method and a silicon wafer detection device
  • A silicon wafer detection method and a silicon wafer detection device
  • A silicon wafer detection method and a silicon wafer detection device

Examples

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no. 1 example

[0063] Such as figure 1 As shown, the LED annular light source and the camera are fixed to the table, and the silicon wafer is placed on the sample stage, and the silicon sample is irradiated with an LED annular source, and the color image of the silicon wafer is collected, and then the color image is transmitted to the computer. deal with. In this embodiment, the workbench, sample table and camera are placed in the housing. The computer collected color images collected by the camera:

[0064] (1) Use the MATLAB software to collect data information of each pixel point in color images, according to the three color components of each of the pixel points, the three color components of each pixel point, the commonly used graylation processing formula is i = 0.3 R + 0.59 g + 0.11b, converting the color image into a grayscale image. Those skilled in the art will readily appreciate that if the grayscale image (ie, black and white photo) of the silicon wafer is directly collected, the con...

no. 2 example

[0080] This example is used to quantify the appearance of the silicon wafer. Repeat the steps (1) to (3) of the first embodiment, Figure 4 The silicon image shown in the gray value distribution statistics, calculating the ratio of the pixel point corresponding to each of the grayscale values ​​I or the grayscale interval accounts for the ratio of the total number of pixels ("Pixel points"), preferably Draw gray value distribution curve (such as Figure 5 Indicated). The number of pixel points corresponding to each grayscale value accounts for comparison with the ratio of the total pixel point (in this embodiment, the ratio threshold is 0.001), and the gradation value corresponding to the ratio of the ratio value is an abnormal gray value. The gradation value corresponding to the ratio of the ratio of above 0.001 is the normal gray value; the width L of the normal gray value is calculated, that is, the difference between the highest normal gray value and the lowest normal gray value...

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Abstract

The present invention provides a silicon wafer detection method, comprising the following steps: Step 1: Determine the specific position of the silicon wafer based on the gray value of each pixel in the gray image of the silicon wafer, thereby obtaining an accurate image of the silicon wafer to be analyzed; step Two: Perform gray value distribution statistics on the accurate silicon wafer image to be analyzed, and / or calculate the average gray value of all pixels in the accurate silicon wafer image to be analyzed; and step three: based on the gray The reflectance of the silicon wafer is calculated based on the gray value average value, and / or the crystal flower condition of the silicon wafer is determined based on the gray value distribution statistics. The silicon chip detection method of the invention can quantify the appearance of the silicon chip, avoid the difference of subjective judgment, and has high speed, high precision and high repeatability.

Description

Technical field [0001] The invention belongs to the field of solar cells, and more particularly to a silicon wafer detecting method and a silicon detecting device. Background technique [0002] Solar cells are devices that directly convert light energy into electrical energy by photoelectric effect or photochemical effect, and the silicon-based solar cell operated by photovoltaic effects is mainstream. During the preparation of silicon-based solar cells, the treatment and detection of silicon wafers is very important. For example, using different process methods, different crystals of the polysilicon silicon silicon silicon silicon silicon silicon wafer will have a reflective difference, and the spark in the appearance, if the graft is serious, it will seriously affect the appearance and finished rate of solar cells, thereby affecting solar energy. The battery's photoelectric conversion efficiency and cost. Therefore, it is necessary to detect the silicon wafers, especially the r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06T7/00G06T5/00
CPCG06T7/0004G06T2207/30148G06T5/70
Inventor 陈全胜刘尧平陈伟吴俊桃赵燕王燕杜小龙
Owner INST OF PHYSICS - CHINESE ACAD OF SCI