Preparation method of solar photovoltaic glass with micro-nano anti-reflection layer

A solar photovoltaic and anti-reflection layer technology, applied in photovoltaic power generation, coatings, semiconductor devices, etc., can solve the problems of unsuitability for large-scale production, complex preparation process, poor resolution, etc., and achieve high resolution and high light conversion efficiency Performance, simple process, and the effect of improving light conversion rate

Active Publication Date: 2019-05-17
RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these preparation methods have disadvantages such as complex preparation process, high cost, and poor resolution, so they are easily limited in the process of industrial production and application, and are not suitable for large-scale production.

Method used

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  • Preparation method of solar photovoltaic glass with micro-nano anti-reflection layer
  • Preparation method of solar photovoltaic glass with micro-nano anti-reflection layer
  • Preparation method of solar photovoltaic glass with micro-nano anti-reflection layer

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preparation example Construction

[0032] see figure 1 , the preparation method of the solar photovoltaic glass with micro-nano anti-reflection layer of the present invention, it comprises the steps:

[0033] Step 100, cleaning and drying the glass substrate.

[0034] Specifically, the glass substrate is placed in an ultrasonic cleaning machine, and an appropriate amount of cleaning agent is added for ultrasonic cleaning for 5-10 minutes (min); the cleaned glass substrate is taken out, soaked with a solvent for a period of time, and then cleaned with an inert gas blow dry.

[0035] Wherein, the thickness of the glass substrate is 0.3-0.5 nanometer (nm). It can be understood that the purpose of cleaning the glass substrate is to remove the pollutants on the glass substrate, thereby avoiding the scattering and absorption of incident light by the pollutants, thereby improving the light conversion rate of the solar photovoltaic glass. The cleaning agent for cleaning the glass substrate is an organic solvent. Th...

Embodiment 1

[0057] Put the glass substrate with a thickness of 0.4nm into an ultrasonic cleaning machine, and use absolute ethanol to ultrasonically clean it for about 5-10 minutes, so as to remove the pollutants on the glass substrate. The glass substrate was taken out, soaked with deionized water for 2 minutes, and the chemical reagents remaining on the surface were removed, and then the glass was blown dry with nitrogen gas. Put the cleaned glass substrate into an oxygen plasma and etch for 4 minutes to prepare a modified glass substrate. Put the modified glass substrate into a 200°C oven and bake for 30 minutes to remove the reactant formed by the reaction between the reaction gas and the glass substrate in oxygen plasma etching, and cool it to room temperature. The silicone adhesion promoter was coated on the surface of the cover glass by a spin coating process, wherein the spin coating speed was 4000rpm, and the spin coating time was 60s, so as to form a coating of the silicone adh...

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Abstract

The invention discloses a preparation method of solar photovoltaic glass with a micro-nano antireflection layer. The preparation method comprises the following steps of a, putting a glass substrate into oxygen plasma to be etched to prepare a modified glass substrate; b, coating the surface of the modified glass substrate with a layer of organic silicon adhesion promoter to form an organic siliconadhesion promoter coating layer; c, coating the surface of the organic silicon adhesion promoter coating layer with a layer of photoresist to form a photoresist coating layer; d, putting the glass substrate comprising the photoresist coating layer into vacuum impressing equipment to be impressed, and performing irradiating by adopting an ultraviolet source, after the photoresist is cured and shaped, stopping irradiating to prepare an anti-reflection layer precursor; and e, removing the vacuum impressing equipment, putting the anti-reflection layer precursor into a plasma etching cavity, adding a reaction gas for performing an etching reaction to prepare the solar photovoltaic glass with the micro-nano antireflection layer. The preparation process is simple, and the prepared solar photovoltaic glass has high resolution and high optical conversion efficiency and performance.

Description

technical field [0001] The invention belongs to the technical field of preparation of an anti-reflection layer, in particular to a method for preparing solar photovoltaic glass with a micro-nano anti-reflection layer. Background technique [0002] Photovoltaic power generation has attracted worldwide attention, and photovoltaic technology is widely used in solar cells. Solar cells are usually installed outdoors. Although the glass substrate on the surface can prevent dust, moisture and external impact, the pollutants accumulated on the glass substrate can easily absorb sunlight and scatter sunlight, and The refractive index mismatch between the atmosphere and the glass substrate will cause a large amount of reflection and refraction when the incident light reaches the surface of the solar cell, thereby reducing the photoelectric conversion rate of the solar cell. [0003] Existing solar cells design a micro-nano structure layer on the surface of the glass substrate to reduc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0216C03C17/30
CPCC03C17/30C03C2217/732C03C2218/119C03C2218/31C03C2218/33H01L31/02168Y02E10/50
Inventor 檀满林代梅田勇
Owner RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN
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