Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Chiral azobenzene polymer and production method thereof

A kind of technology of azo polymer and manufacturing method, applied in the direction of optical recording carrier, recording carrier material, etc., can solve the problems of complex storage process of holographic optical storage materials, inability to realize holographic optical storage of information, non-repeatable erasing and writing, etc.

Inactive Publication Date: 2018-04-03
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF3 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to overcome the shortcomings of existing azo materials as holographic optical storage materials, which will form surface relief gratings during the holographic optical storage process and destroy the information stored in the storage medium, and cannot realize the holographic optical storage of information. Provide a new chiral azo polymer material and its manufacturing method that can efficiently realize the purpose of holographic optical storage, solve the problems of complex storage process, non-rewritable, low efficiency, and high cost of existing holographic optical storage materials, and broaden the scope of holographic optical storage. Types of storage materials

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chiral azobenzene polymer and production method thereof
  • Chiral azobenzene polymer and production method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] (1) Preparation of S-2-methyl-1-bromobutane: Dissolve 1.02g of S-2-methyl-1-butanol in 40mL of dichloromethane and cool to 0°C, add 5.40g of tribromide Phosphorus was added dropwise to the above solution at a rate of 30 drops per minute. After the addition, the reaction was continued for 2 hours to obtain S-2-methyl-1-bromobutane;

[0019] (2) Preparation of 4-aminobenzoic acid S-2-methylbutyl ester: Add 3.02g 4-aminobenzoic acid and 2.91g S-2-methyl-1-bromobutane to 50mL dimethylformamide Add 3.04g potassium bicarbonate as a catalyst, and react at 50°C for 24h to obtain 4-aminobenzoic acid S-2-methylbutyl ester;

[0020] (3) Preparation of polyurethane: 2.51g diphenylmethane-4,4'-diisocyanate and 1.81g N,N-dihydroxyethylaniline were added to 25mL dimethylformamide, and then 50μL dilauric acid Butyltin is used as a catalyst and reacted at 80℃ for 12h to obtain polyurethane;

[0021] (4) Preparation of chiral azo polymer: add 1.21g of 4-aminobenzoic acid S-2-methylbutyl ester...

Embodiment 2

[0024] (1) Preparation of S-2-methyl-1-bromobutane: the same as the process in Example 1;

[0025] (2) Preparation of S-2-methylbutyl 4-aminobenzoate: the same as the process in Example 1;

[0026] (3) Preparation of polyurethane: 2.51g diphenylmethane-4,4'-diisocyanate and 1.81g N,N-dihydroxyethylaniline were added to 25mL dimethylformamide, and then 50μL dilauric acid Butyltin is used as a catalyst and reacted at 80℃ for 8h to obtain polyurethane;

[0027] (4) Preparation of chiral azo polymer: the same as the process in Example 1;

[0028] The structural formula of the obtained chiral polymer is as attached figure 1 As shown, the molecular weight is 1.73x10 4 Under 532nm interference laser irradiation, a clear holographic pattern can be stored on the surface of the chiral azo polymer film, and the formed holographic pattern can be erased and rewritten.

Embodiment 3

[0030] (1) Preparation of S-2-methyl-1-bromobutane: the same as the process in Example 1;

[0031] (2) Preparation of S-2-methylbutyl 4-aminobenzoate: the same as the process in Example 1;

[0032] (3) Preparation of polyurethane: 2.51g diphenylmethane-4,4'-diisocyanate and 1.81g N,N-dihydroxyethylaniline were added to 25mL dimethylformamide, and then 50μL dilauric acid Butyltin is used as a catalyst and reacted at 80℃ for 16h to obtain polyurethane;

[0033] (4) Preparation of chiral azo polymer: the same as the process in Example 1;

[0034] The structural formula of the obtained chiral polymer is as attached figure 1 As shown, the molecular weight is 3.73x10 4 Under 532nm interference laser irradiation, a clear holographic pattern can be stored on the surface of the chiral azo polymer film, and the formed holographic pattern can be erased and rewritten.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a chiral azobenzene polymer and a production method of the chiral azobenzene polymer. The chiral azobenzene polymer is a polyurethane material with a chiral group and an azobenzene group on a side chain. The production method of the chiral azobenzene polymer takes S-2-methyl-1-butanol as a chiral source, the S-2-methyl-1-butanol and 4-aminobenzoic acid react to obtain 4-aminobenzoic acid-S-2-methyl butyl ester, the polyurethane is prepared through condensation polymerization of diisocyanate and N,N-dihydroxyethylaniline, and finally the 4-aminobenzoic acid-S-2-methyl butyl ester and the polyurethane are subjected to a diazo coupling reaction to obtain the corresponding chiral azobenzene polymer. The main chain structure of the chiral azobenzene polymer is changed by changing the structure of the diisocyanate, and the molecular weight of the chiral azobenzene polymer is regulated by controlling the reaction time of condensation polymerization and the reactant ratio of the diazo coupling reaction. The surface of the chiral azobenzene polymer realizes holographic optical storage of information under the radiation of interference laser of 450-550 nm, and a formed holographic pattern can be erased and rewritten.

Description

Technical field [0001] The invention relates to a chiral polymer and a manufacturing method thereof, and belongs to the field of functional polymer material manufacturing. The chiral azo polymer can be used as a new functional polymer material in the field of holographic optical storage. Background technique [0002] An azo molecule refers to a molecule containing a nitrogen-nitrogen double bond in its structure. The benzene ring is connected to both ends of the nitrogen-nitrogen double bond to form an azophenyl group. Azobenzene polymer can be obtained by linking the azophenyl group to the polymer through a covalent bond. Azo polymers are a type of light-responsive materials that have been widely reported. Azophenyl groups can undergo reversible photo-induced cis-trans isomerization, while the shape and dipole moment of cis- and trans-configurations of azobenzene have a large gap. The changes caused by cis-trans isomerization can be Drive the movement of polymer materials on ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08G18/32C08G18/76C08G18/83G11B7/245
CPCC08G18/329C08G18/7671C08G18/833G11B7/245
Inventor 危仁波尤勇童利芬刘孝波
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com