Heating control device and method for chemical vapor deposition

Abstract

The present invention proposes a heating control method in chemical vapor deposition equipment, the steps include: (1) setting the coating chamber with a plurality of grids arranged vertically and horizontally, a heating element is arranged in each grid, and a heating element is also set in the grid The temperature feedback device, the heating element and the temperature feedback device are all connected to the heating controller. (2) Seal the coating chamber and evacuate it to 0.01-1 Torr through a vacuum system. (3) Use the heating element and the temperature feedback device to connect to the heating controller, and control the temperature of the area where the grid is located between 30 and 100°C. (4) Put the parylene material into the evaporation chamber to heat and vaporize, and after the pyrolysis reaction in the cracking chamber, gas is formed, and the gas enters the coating chamber. During the ventilation process, the temperature of the area where the grid is located is kept at 30-100°C, and the obtained film material. The heating control method of the present invention utilizes grid partitions to independently heat and control the temperature, thereby improving the crystallization rate and uniformity of the parylene coating.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition (CVD), in particular to a heating control device and a heating control method for chemical vapor deposition. Background technique [0002] Chemical vapor deposition (CVD) is a traditional technique for preparing thin films, which is widely used in the deposition of various materials in the semiconductor industry, including a wide range of insulating materials, most metal materials and metal alloy materials. The principle is to use gaseous precursor reactants to decompose or react with each other in some components of gaseous precursors through chemical reactions between atoms and molecules, and deposit and form thin films on the substrate. [0003] Existing parylene coating equipment can be roughly divided into two types: barrel type coating machine and box type coating machine. The working principles of the two are basically the same, the main difference is the shape of the vac...

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Problems solved by technology

[0004] In order to solve the above problems, the present invention provides a chemical vapor deposition heating control device and heating control method to solve a series of problems such as whitening of the film layer, uneven film thickness, and tissue defects in the current chemical vapor deposition process.

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