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343results about How to "Increase crystallization rate" patented technology

Erythritol crystal and preparation method of erythritol crystal

The invention relates to the technical field of compound sugar, in particular to an erythritol crystal, which comprises erythritol and sweet agents accounting for 1 to 2.5 percent of the weight of the erythritol. A preparation method of the erythritol crystal comprises the following steps that the erythritol and the sweet agents are mixed and dissolved to obtain liquid solution, the solution is simultaneously evaporated and crystallized, and the erythritol crystals are obtained; the erythritol and the sweet agents are mixed and are dissolved to obtain liquid solution, the liquid solution is subjected to non-evaporation crystallization, the filtering is carried out after the crystallization completion, and the erythritol crystals are obtained; the erythritol and the sweet agents are mixed in a solid from; and the mixed solids are subjected to melting, crystallization, crushing and drying to obtain the erythritol crystals. The sweetness of the erythritol is improved and reaches more than 80 percent of the sweetness of the cane sugar, the consistency of ingredients of compound products of the erythritol and the sweet agents is realized, the problem of cocrystallization of the erythritol and the sweet agents easily carbonized at high temperature is solved, the crystallization rate is improved to the maximum degree, the crystallization efficiency is 5 to 20 percent higher than that of the traditional crystallization technology, and the application field of the product is enlarged.
Owner:BAOLINGBAO BIOLOGY

VGF/VB gallium arsenide single-crystal furnace structure and growing method

The invention discloses a VGF / VB gallium arsenide single-crystal furnace structure and a growing method. According to the VGF / VB gallium arsenide single-crystal furnace structure, a resistance heatingfurnace which is relatively lowest in production cost and is provided with multiple temperature zones is adopted; a support structure adopts graphite; the support strength is improved; the loading amount is favorably increased; release of latent heat of growth crystallization is facilitated; the crystal yield of crystal growth is favorably improved; a sealing structure with a reusable quartz tubeand a stainless steel flange is adopted; a 1-atm air charging and discharging automatic valve is additionally arranged on an air channel pipeline, so that the balance of inner air pressure and outerair pressure of the quartz tube can be effectively guaranteed, and the influence of deformation of the quartz tube on reuse is avoided. A VGF method and a VB method are used for growing crystals; whenthe crystals are grown by the VB method, the sunken degree of a concave solid-liquid interface of the VGF growth method can be improved, so that the crystal yield is favorably improved. The single-crystal furnace and the growth method are used for growing the gallium arsenide single crystals with maximum size of 8 inches; meanwhile, the quartz tube can be reused, so that the production cost can be reduced; a CO atmosphere doping manner also can be used for controlling the resistivity and the axial resistivity uniformity of semi-insulating gallium arsenide.
Owner:CHINA ELECTRONICS TECH GRP NO 46 RES INST

Manufacturing method of polycrystalline silicon layer and polycrystalline silicon thin film transistor and manufacturing method thereof

The invention discloses a manufacturing method of a polycrystalline silicon layer and a polycrystalline silicon thin film transistor and a manufacturing method thereof, and relates to the field of displaying. According to the manufacturing methods, a crystallization rate of a formed polycrystalline silicon layer is high, crystalline grains are uniform, crystal boundary defects are little, thus electrics properties of the polycrystalline silicon thin film transistor can be improved, and reliability of the polycrystalline silicon thin film transistor is improved. The manufacturing method of the polycrystalline silicon layer includes the steps that a substrate is provided; a barrier layer and a buffer layer are sequentially formed on the substrate; multiple groves are arranged in the buffer layer through a picture composition process, and seed crystals are formed on the buffer layer; an amorphous silicon layer is formed on the buffer layer provided with the grooves and the seed crystals; and the amorphous silicon layer is converted into the polycrystalline silicon layer through adoption of a heating processing process. The manufacturing method of the polycrystalline silicon layer and the polycrystalline silicon thin film transistor and the manufacturing method of the polycrystalline silicon thin film transistor are used for improving quality of polycrystalline silicon films.
Owner:BOE TECH GRP CO LTD +1

Process for producing arc quartz crucible by vacuum plus coating, equipment, product thereof

The invention relates to the crucible manufacturing field and is a process for producing an arc quartz crucible by vacuum plus coating, equipment, products thereof. The invention solves the problems that the crucible manufacturing process in the prior art can not solve the operating requirements of long time, high temperature, and high purity of the quartz crucible, a uniform high purity quartz layer can not be formed in the vacuum state by uniform spraying, the layered spraying can not be accurately and timely carried out, and the like; therefore the process and the equipment for producing the arc quartz crucible by vacuum plus coating are provided; the quartz sand is poured into a vacuum mould to shape a prebuilt shape which is put into a founded chamber; a vacuum pump is started and the temperature is controlled, and then the melting and preheating begin; by controlling two hoppers of a double-hopper charging machine, the high-purity quartz sand is sprayed into the quartz crucible in the process of melting, and then mixing spraying coating is sprayed; the vacuum pump is closed during keeping the temperature. The quartz crucible produced by the process and the equipment of the invention has strong non-deformability of long time and exhaustion resistance in high temperature and can be used for long time.
Owner:余姚市启明石英有限公司

Method for separating and recycling selenium and tellurium from copper anode mud

Disclosed is a method for separating and recycling selenium and tellurium from copper anode mud. The method includes: performing soda sintering on the copper anode mud or copper-removed anode mud obtained after copper removing is performed on the copper anode mud, adding water into the sintered material for leaching, and filtering to obtain selenium-rich leachate and tellurium-rich leach residues; subjecting the selenium-rich leachate to sodium carbonate separating and recycling, using sodium sulfite or SO2 to revivify and recycle selenium in the selenium-rich leachate or filtrate, filtering to obtain rough selenium powder, and further refining the rough selenium powder to obtain metal selenium; leaching the tellurium-rich leach residues via a sulfuric acid solution, filtering to obtain acid leachate and acid leach residues; subjecting the acid leachate to silver separating through chlorination, using sodium sulfite or SO2 to revivify and precipitate tellurium in the chlorinated acid leachate, filtering to obtain rough tellurium powder, and further refining the rough tellurium powder to obtain metal tellurium. The method has the advantages that by the integral redesign of the process and the mutual cooperation of the steps, the process route for separating and recycling the selenium and the tellurium from the copper anode mud is simplified greatly, environmental protection pressure during a copper anode mud processing process is alleviated greatly, and the method conforms to the development tendency of energy saving and emission reduction technical transformation; the method is simple in process, simple to operate, low in production cost, high in selenium and tellurium recycling rate, good in working environment, suitable for industrialized application, and the like.
Owner:CENT SOUTH UNIV

Method for preparing silicon heterojunction solar cell containing composite emission layer

The invention provides a method for preparing a silicon heterojunction solar cell containing a composite emission layer. The method includes the steps that an amorphous silicon back field N is deposited on one face of a substrate C on which a double-faced intrinsic amorphous silicon passivation layer I is deposited, an amorphous silicon layer P2 with the uniform structure is prepared on the face opposite to the amorphous silicon back field N under the conditions that doping concentration, hydrogen dilution and power density are low, a nanocrystalline silicon layer P1 with the uniform structure is prepared under the conditions that the doping concentration, the hydrogen dilution and the power density are improved, and an amorphous silicon / nanocrystalline silicon composite structure formed by the two silicon films serves as the emission layer of the silicon heterojunction solar cell. Materials have the advantages of being high in transmittance and conductivity through the structure, on the basis, the passivation effect of the surface of crystalline silicon can be improved, short wave response and output characteristics of the cell are improved, and the method for preparing the silicon heterojunction solar cell is simple and easy to carry out.
Owner:捷造科技(宁波)有限公司

Method for synthesizing tobermorite whiskers with fly ash as raw material

The invention relates to a method for synthesizing tobermorite whiskers with fly ash as a raw material and belongs to the technical field of nanometer whisker products. According to the method, an addition agent and a calcium resource are mixed uniformly according to the Ca / N molar ratio of (1-1000): 1 to obtain mixed slurry, after the pH value of the mixed slurry is adjusted to be 11-14, the fly ash is added, and in a high-pressure closed container, the mixture reacts at the temperature ranging from 150 DEG C to 260 DEG C, so that the tobermorite whiskers are obtained; the addition agent is a surfactant; the surfactant is an amino compound or a derivative of the amino compound. According to the method, the industrial solid waste fly ash is used as the raw material, the synthesized tobermorite whiskers can serve as a high-quality silicate heat-preserving and fireproofing material, and after being separated and purified, the tobermorite whiskers can also serve as an inorganic addition agent of a function composite material. The method is simple, feasible and beneficial for promoting high value-added utilization of the fly ash resource, and the product can be applied to the fields of building materials, metallurgy materials, chemical engineering materials and the like.
Owner:CENT SOUTH UNIV
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