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A method to enhance the photocatalytic performance of zno nanorod arrays

A nanorod array and photocatalytic technology, which is applied in the field of nanomaterials, can solve the problems of not being able to use the photocatalytic performance of ZnO, and achieve the effect of improving photocatalytic efficiency and good verticality

Active Publication Date: 2020-08-18
XIAN UNIV OF TECH
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Problems solved by technology

[0005] The purpose of the present invention is to provide a method for improving the photocatalytic performance of ZnO nanorod arrays, which solves the problem that the prior art cannot use the water flow fluctuation energy existing in the photocatalytic environment to improve the photocatalytic performance of ZnO. The present invention utilizes dynamic piezoelectric electric field The continuous separation of photogenerated carriers in ZnO crystals makes the photocatalytic efficiency of ZnO nanorod arrays increase by up to 200% within 2 hours

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  • A method to enhance the photocatalytic performance of zno nanorod arrays

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preparation example Construction

[0031] Step 1, preparation of ZnO seed layer substrate;

[0032] Step 1.1. Put the FTO substrate cut into 2cm×1cm into a mixed solution of absolute ethanol-acetone-isopropanone with a volume ratio of 1:1:1. After ultrasonic cleaning for 30 minutes, take it out and rinse it with deionized water. , and placed in an oven, dried at 60°C for later use;

[0033] Step 1.2, zinc acetate (Zn(CH 3 COO) 2 ) and sodium hydroxide (NaOH) solids are dissolved in ethanol respectively, then, take the above-mentioned Zn (CH 3 COO) 2 solution and the above-mentioned NaOH solution were added to the ethanol solution to dilute, before and after dilution Zn(CH 3 COO) 2 The concentration ratio of NaOH is 1:7, and the concentration ratio of NaOH is 1:2.5. After that, the above two diluted ethanol solutions are heated to 65°C in a water bath and mixed, and kept at 65°C for 45min, and the ZnO seeds obtained after natural cooling layer solution. Apply 6mL of the ZnO seed layer solution on the FTO ...

Embodiment 1

[0044] Step 1. Preparation of ZnO seed layer substrate: put the FTO substrate cut into 2cm×1cm into the mixed solution of absolute ethanol-acetone-isopropanone with a volume ratio of 1:1:1, and ultrasonically clean it for 30 minutes. Remove and rinse with deionized water. Put the cleaned FTO substrate into an oven and dry it at 60°C for later use. Configure 3mM zinc acetate (Zn(CH 3 COO) 2 ) and 5mM sodium hydroxide (NaOH) ethanol solution, take 8mL of the above-mentioned Zn (CH 3 COO) 2 solution and 8 mL of the above NaOH solution were added to 64 mL and 20 mL of ethanol solution for dilution. The above two solutions were heated to 65°C in a water bath, mixed, and kept at 65°C for 45 minutes, cooled naturally for later use. 6mL ZnO seed layer solution was coated on the FTO substrate, and the next coating was performed after it evaporated naturally, and the coating was repeated several times to ensure the thickness of the ZnO seed layer, and finally the ZnO precursor film...

Embodiment 2

[0048] Step 1. Preparation of ZnO seed layer substrate: put the FTO substrate cut into 2cm×1cm into the mixed solution of absolute ethanol-acetone-isopropanone with a volume ratio of 1:1:1, and ultrasonically clean it for 30 minutes. Remove and rinse with deionized water. Put the cleaned FTO substrate into an oven and dry it at 60°C for later use. Configure 3mM zinc acetate (Zn(CH 3 COO) 2 ) and 5mM sodium hydroxide (NaOH) ethanol solution, take 8mL of the above-mentioned Zn (CH 3 COO) 2 solution and 8 mL of the above NaOH solution were added to 64 mL and 20 mL of ethanol solution for dilution. The above two solutions were heated to 65°C in a water bath, mixed, and kept at 65°C for 45 minutes, cooled naturally for later use. 6mL ZnO seed layer solution was coated on the FTO substrate, and the next coating was performed after it evaporated naturally, and the coating was repeated several times to ensure the thickness of the ZnO seed layer, and finally the ZnO precursor film...

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Abstract

A method for improving the photocatalytic performance of a ZnO nanorod array disclosed in the present invention is specifically implemented according to the following steps: first, the preparation of the ZnO seed layer substrate, secondly, the preparation of the ZnO nanorod array film, and finally, the prepared For the further processing of the ZnO nanorod array film, in the piezoelectric photocatalysis process, turn on the ultraviolet lamp, run the shaker shaker, and measure the absorbance before and after the piezoelectric photocatalysis by using an ultraviolet spectrophotometer (wavelength is 466nm). And calculate its piezoelectric photocatalytic efficiency. The method disclosed by the invention has the advantage of utilizing the energy of water flow fluctuations in the photocatalysis process to improve the photocatalysis performance of the ZnO nanorod array.

Description

technical field [0001] The invention belongs to the technical field of nanometer materials, and relates to a method for improving the photocatalytic performance of a ZnO nanorod array. Background technique [0002] Semiconductor photocatalysts use sunlight for energy conversion or environmental purification, and have broad application prospects in the fields of pollutant degradation, hydrogen production by photolysis of water, and solar cells. Due to the advantages of simple preparation process, low cost, non-toxicity, good photochemical stability, and strong redox ability, ZnO is the most likely substitute for TiO. 2 semiconductor photocatalysts. However, ZnO photocatalysts are difficult to reuse, and the photogenerated carrier separation efficiency is low, resulting in low photocatalytic activity, which seriously hinders the industrial application of ZnO photocatalysts. The problem that ZnO photocatalysts are difficult to reuse can be solved by preparing ZnO nanorod arra...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J23/06B01J35/00B01J35/02B01J37/34
CPCB01J23/06B01J37/342B01J35/40B01J35/39
Inventor 赵敬忠白杨吕振林
Owner XIAN UNIV OF TECH
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