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Atomic layer deposition regeneration process of denitration catalyst

An atomic layer deposition, denitration catalyst technology, applied in catalyst regeneration/reactivation, physical/chemical process catalyst, metal/metal oxide/metal hydroxide catalyst, etc., can solve high oxidation, increase production cost, catalyst damage and other problems, to achieve the effects of good dispersibility, high denitration efficiency and low SO2 oxidation rate

Inactive Publication Date: 2018-05-04
JIANGSU LONGKING COALOGIX CATALYST REGENERATION CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The regeneration of denitrification catalysts is supplemented by the general impregnation method. In actual mass production, the amount of active substances cannot be precisely controlled, resulting in unstable denitrification efficiency, SO 2 High oxidation and high temperature calcination increase production cost and damage the catalyst during the regeneration process

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0012] An atomic layer deposition regeneration process for a denitration catalyst, comprising the steps of:

[0013] 1) Pretreatment of the deactivated denitrification catalyst: remove the dust on the surface of the deactivated denitrification catalyst by a negative pressure vacuum cleaner, then immerse the catalyst in a deionized aqueous solution containing 0.06% lactic acid and 0.12% oxalic acid, ultrasonicate at 25HZ for 35min, take it out and store it at 125°C Dry for 35 minutes;

[0014] 2) Implantation of active substances by atomic layer deposition method: put the catalyst treated in step 1) into the reaction chamber of the atomic layer deposition equipment, and seal the reaction chamber; vacuumize the atomic layer deposition system and introduce high-purity nitrogen gas to adjust The outlet valve of the reaction chamber makes the pressure in the chamber negative, and the deposition temperature is set at 330°C; the vanadium triisopropoxylate precursor is injected into t...

Embodiment 2

[0016] An atomic layer deposition regeneration process for a denitration catalyst, comprising the steps of:

[0017] 1) Pretreatment of the deactivated denitrification catalyst: remove the dust on the surface of the deactivated denitrification catalyst by a negative pressure vacuum cleaner, then immerse the catalyst in a deionized aqueous solution containing 0.09% lactic acid and 0.18% oxalic acid, ultrasonicate at 35HZ for 55min, take it out and store it at 145°C Dry for 85min;

[0018] 2) Implantation of active substances by atomic layer deposition method: put the catalyst treated in step 1) into the reaction chamber of the atomic layer deposition equipment, and seal the reaction chamber; vacuumize the atomic layer deposition system and introduce high-purity nitrogen gas to adjust The outlet valve of the reaction chamber makes the pressure in the chamber negative, and the deposition temperature is set at 380°C; the precursor of triisopropoxyvanadium oxide is injected into th...

Embodiment 3

[0020] An atomic layer deposition regeneration process for a denitration catalyst, comprising the steps of:

[0021] 1) Pretreatment of the deactivated denitrification catalyst: remove the dust on the surface of the deactivated denitrification catalyst by a negative pressure vacuum cleaner, then immerse the catalyst in a deionized aqueous solution containing 0.08% lactic acid and 0.14% oxalic acid, sonicate at 30HZ for 40min, take it out and store it at 135°C Dry for 55 minutes;

[0022] 2) Implantation of active substances by atomic layer deposition method: put the catalyst treated in step 1) into the reaction chamber of the atomic layer deposition equipment, and seal the reaction chamber; vacuumize the atomic layer deposition system and introduce high-purity nitrogen gas to adjust The outlet valve of the reaction chamber keeps the pressure in the chamber at negative pressure, and the deposition temperature is set at 365°C; the vanadium oxide precursor of acetylacetonate is i...

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PUM

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Abstract

The invention discloses an atomic layer deposition regeneration process of a denitration catalyst. The process comprises the following steps: (1) carrying out pretreatment on the deactivated denitration catalyst; (2) adopting an atomic layer deposition method for to implant active substances. According to the process, an atomic layer deposition technology is used for supplementing the active substances, and the active substances are adsorbed inside and outside of catalyst pores, have a strong interaction with the deactivated catalyst and are uniformly distributed in the catalyst; the amount ofthe supplementary active materials also can be regulated and controlled by controlling the atomic deposition number, the implanted active substances, i.e., vanadium oxide and tungsten oxide can be precisely controlled, and the active substances can be inhibited from being sintered, so that high denitration efficiency and low SO2 oxidation rate are realized in a denitration reaction. Furthermore,the regenerated catalyst does not need to be calcined, and the entire process does not cause damage to the catalyst.

Description

technical field [0001] The invention relates to the field of regeneration of denitration catalysts, in particular to an atomic layer deposition regeneration process of denitration catalysts. Background technique [0002] Regeneration of denitrification catalyst is to analyze the cause of catalyst deactivation, adopt corresponding technological means to eliminate catalyst deactivation factors, restore activity and selectivity of deactivated denitrification catalyst, and reuse it. The regeneration of denitrification catalysts is supplemented by the general impregnation method. In actual mass production, the amount of active substances cannot be precisely controlled, resulting in unstable denitrification efficiency, SO 2 High oxidation and high temperature calcination increase the production cost and damage the catalyst during the regeneration process. Contents of the invention [0003] The object of the present invention is to provide a denitrification catalyst regeneration...

Claims

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Application Information

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IPC IPC(8): B01J38/00B01J38/62B01J38/68B01J23/92B01J23/22
CPCB01J23/22B01J23/92B01J38/00B01J38/62B01J38/68
Inventor 张涛何伟刘安阳罗春云
Owner JIANGSU LONGKING COALOGIX CATALYST REGENERATION CO LTD
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