Method for removing fluorine ions from F22 by-product hydrochloric acid

A technology for by-product hydrochloric acid and fluoride ions, which is applied to chemical instruments and methods, halogen/halogen acids, compounds of elements in Group 4/14 of the periodic table, etc., can solve the problem of high fluoride ion content, and achieve simple and reliable process equipment. Strong operability and achieve the effect of repeated use

Inactive Publication Date: 2018-05-11
ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the F 22 The problem of excessive fluoride ion content in the by-product hydrochloric acid, without changing the existing production process, the present invention provides an environmentally friendly, simple and effective method for removing fluoride ions

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  • Method for removing fluorine ions from F22 by-product hydrochloric acid
  • Method for removing fluorine ions from F22 by-product hydrochloric acid
  • Method for removing fluorine ions from F22 by-product hydrochloric acid

Examples

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Embodiment 1

[0048] This example provides a method for removing F 22 The method for fluoride ions in by-product hydrochloric acid, the method is specifically: weigh 15.4g of hexamethyldisiloxane and 180mL of by-product hydrochloric acid in a single-necked flask, the content of the original fluoride ion of hydrochloric acid is 1030.9ppm, hexamethyldisiloxane The actual amount of ether for fluoride ions is 20 times the theoretical amount, sealed to isolate the air, kept at a constant temperature of 30°C, and stirred at high speed by a magnetic stirrer for 2 hours. The drying tower uses granular calcium oxide, and 0.1mol / L NaOH is used to recover the solution. After finishing, let the reaction solution stand still, that is, the fluoride ion is removed.

[0049] The present embodiment adopts the following method to measure the fluoride ion content: accurately measure 10mL sample with a clean pipette, put it in a 50mL beaker, add 10mL total ionic strength adjustment buffer, and mix it with 100g...

Embodiment 2

[0051] This example provides a method for removing F 22 The method for fluoride ions in by-product hydrochloric acid, the method is specifically: weigh 15.4g of hexamethyldisiloxane and 180mL of by-product hydrochloric acid in a single-necked flask, the content of the original fluoride ion of hydrochloric acid is 1417.7ppm, hexamethyldisiloxane The actual amount of ether for fluoride ions is 15 times the theoretical amount, sealed to isolate the air, kept at a constant temperature of 30°C, and stirred at high speed by a magnetic stirrer for 2 hours. The drying tower uses granular calcium oxide, and 0.1mol / L NaOH is used to recover the solution. After finishing, let the reaction solution stand still, that is, the fluoride ion is removed.

[0052] The present embodiment adopts the following method to measure the fluoride ion content: accurately measure 10mL sample with a clean pipette, put it in a 50mL beaker, add 10mL total ionic strength adjustment buffer, and mix it with 100g...

Embodiment 3

[0054] This example provides a method for removing F 22 The method for fluoride ions in by-product hydrochloric acid, the method is specifically: weigh 9.0g of hexamethyldisiloxane and 450mL of by-product hydrochloric acid in a single-necked flask, the content of the original fluoride ion of hydrochloric acid is 492.4ppm, hexamethyldisiloxane The actual amount of ether for fluoride ions is 10 times the theoretical amount, sealed to isolate the air, kept at a constant temperature of 30°C, and stirred at a high speed by a magnetic stirrer for 1 hour. The drying tower uses granular calcium oxide, and 0.1mol / L NaOH is used to recover the solution. After finishing, let the reaction solution stand still, that is, the fluoride ion is removed.

[0055] The present embodiment adopts the following method to measure the fluoride ion content: accurately measure 10mL sample with a clean pipette, put it in a 50mL beaker, add 20mL total ionic strength adjustment buffer, and mix it with 200g / ...

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Abstract

The invention relates to a method for removing fluorine ions from F22 by-product hydrochloric acid. According to the method, hexamethyl disiloxane is added into the F22 by-product hydrochloric acid for reaction to produce trimethylfluorosilane, thus realizing removal of fluorine ions. The method converts the F22 by-product hydrochloric acid from waste acid into finished product acid, and belongs to the organic synthesis field. The process unit is simple, can achieve continuous operation under normal pressure, and the trimethylfluorosilane produced by cracking is condensed by an alkali metal salt to further produce hexamethyl disiloxane. The method realizes reutilization of the raw materials, is environmentally friendly, and is easy for industrial production.

Description

technical field [0001] The invention relates to the technical field of organic synthesis, in particular to a method for removing F 22 A method for by-product fluoride ions in hydrochloric acid. Background technique [0002] f 22 (Difluorochloromethane) is a basic organic chemical product with a wide range of uses. It is mainly used as a raw material for making polytetrafluoroethylene and as a refrigerant for large-scale refrigeration equipment. Currently domestic F 22 The production process of the product generally adopts a water washing process, that is, the reaction product is washed with water and alkali to remove HCl and HF, and then dehydration, rectification and other unit operations can finally produce F 22 finished product. Catalyzed reaction with chloroform (CHCl 3 ) and anhydrous hydrogen fluoride (AHF) as raw materials, in the catalyst antimony pentachloride (SbCl 5 ) under the participation of a certain temperature and pressure to generate F 22 . The reac...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/07C07F7/08
CPCC01B7/0706C07F7/0874
Inventor 罗源军刘波吕太勇宋亦兰李俊玲王雯霞庹洪杨旭仓张鸣李斌
Owner ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD
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