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Cleaning solution for optical materials

A technology for optical materials and cleaning fluids, applied in the direction of detergent compounding agents, detergent compositions, chemical instruments and methods, etc., can solve the problems of unsuitability for large-scale use and complicated steps, achieve low cost, reduce contact probability, increase The effect of cleaning effect

Active Publication Date: 2018-05-18
TSINGHUA UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this patent, a highly toxic carbon tetrachloride solution is used as a cleaning solution, and the steps are complicated, so it is not suitable for large-scale use

Method used

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  • Cleaning solution for optical materials
  • Cleaning solution for optical materials

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Experimental program
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Effect test

Embodiment 1

[0035] Preparation of cleaning solution: under constant stirring, add phosphate ester series surfactants to deionized water until they are completely dissolved, then add hydrogen bond breakers, complexing agents, alcohols and salts in sequence, and finally add pH regulators , the pH of the cleaning solution=8.6. The content of each component is respectively: anionic surfactant (MOA-3P) 10wt%, hydrogen bond breaker (urea) 0.1wt%, complexing agent (NTA) 5wt%, alcohols (ethanol) 10wt%, pH adjustment Wetting agent (hydrochloric acid) 0.1wt%, salt (potassium nitrate) 0.5wt%. The atomic force microscope detects the surface residue effect after cleaning, and there are no surface particles and other residues.

Embodiment 2

[0037] Preparation of cleaning solution: under constant stirring, add phosphate ester series surfactants to deionized water until they are completely dissolved, then add hydrogen bond breakers, complexing agents, alcohols and salts in sequence, and finally add pH regulators , the pH of the cleaning solution=5.2. Make each component content be respectively: anionic surfactant (TXP-10) 4wt%, hydrogen bond breaking agent (formamide) 0.5wt%, complexing agent (EDTA) 1wt%, alcohols (ethylene glycol) 5wt% , PH regulator wetting agent (acetic acid) 1wt%, salt (sodium phosphate) 0.1wt%. The atomic force microscope detects the surface residue effect after cleaning, with a small amount of surface particles and no other residues.

Embodiment 3

[0039] Preparation of cleaning solution: under constant stirring, add phosphate ester series surfactants to deionized water until they are completely dissolved, then add hydrogen bond breakers, complexing agents, alcohols and salts in sequence, and finally add pH regulators , the pH of the cleaning solution=9.1. Make each component content be respectively: anionic surfactant (NP-10PK-80) 5wt%, hydrogen bond breaker (guanidine hydrochloride) 0.3wt%, complexing agent (EDTA) 2wt%, alcohols (glycerol) 7wt%, PH regulator wetting agent (potassium hydroxide) 2wt%, salt (sodium sulfate) 0.6wt%. The atomic force microscope detects the surface residue effect after cleaning, and there are no surface particles and other residues.

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Abstract

The invention relates to a cleaning solution for optical materials, and belongs to the technical field of optical material cleaning. The cleaning solution comprises an anionic surfactant, a hydrogen bond breaker, a complexing agent, alcohol, a PH adjuster, salt and water and is suitable for cleaning away surface particles of fused quartz, K9 glass, glass ceramic and other polished optical materials. After the cleaning solution is diluted by 1-10 times, the polished optical materials are subjected to ultrasonic cleaning in the cleaning solution for 5-10 minutes and then subjected to ultrasoniccleaning in deionized water for 1-10 minutes to remove the cleaning solution on the surfaces of the optical materials. By using the cleaning solution, contaminants, such as organic contaminants, particles and ion residues, on the surfaces of the polished optical materials can be removed. A hydrogen bond inhibitor contained in the cleaning solution can overcome the defect that the surfaces of the polished optical materials easily adsorb the particles, and the surface particles of the optical materials are effectively removed.

Description

technical field [0001] The invention relates to an optical material cleaning solution, which belongs to the technical field of optical material cleaning, in particular to a technical field for cleaning surface particles of fused quartz, K9 glass and glass-ceramics after polishing. Background technique [0002] With the continuous improvement of the performance of the optical system, the requirements for the precision index and surface quality of optical elements and components have become higher and higher in recent years. As an important processing procedure of optical components, chemical mechanical polishing can eliminate defects such as mechanical damage, residual subsurface cracks and residual stress on the surface of optical materials. However, organic matter, particles and metal ions will inevitably appear on the surface of the material after polishing. . Especially for typical optical materials such as fused silica, K9 glass and glass ceramics, there are a large num...

Claims

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Application Information

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IPC IPC(8): C11D1/34C11D3/60C11D3/32C11D3/33C11D3/20C11D3/04C11D3/06C11D3/10C11D3/30
CPCC11D1/345C11D3/04C11D3/042C11D3/044C11D3/046C11D3/048C11D3/06C11D3/10C11D3/201C11D3/2044C11D3/2065C11D3/2079C11D3/30C11D3/32C11D3/323C11D3/33
Inventor 潘国顺陈高攀罗海梅徐莉罗桂海周艳邹春莉
Owner TSINGHUA UNIV
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