Metal polish liquid, and prepartion method

Abstract

This invention relates to a metal polishing solution, which is composed of: abrasive material 10-50 wt. %, surfactant 0.1-1 wt. %, pH regulator 1-5 wt. %, chelating agent 0.1-1 wt. %, and deionized water as balance. The granularity of the abrasive material is 15-100 nm. The pH value of the metal polishing solution is 8-12. The metal polishing solution is prepared by: filtering and purifying the above components of the metal polishing solution, introducing the components into a container through a mass flowmeter under negative pressure in a class 1000 clean room, and stirring uniformly. The metal polishing solution has such advantages as high polishing speed, high smoothness, small diameters, and little damage to wafer surface, wasy cleaning, no toxicity, no odor, no corrosion, simple process and easy operation.

Description

(1) Technical field

[0001] The invention relates to a polishing liquid and a preparation method thereof, in particular to a metal polishing liquid and a preparation method thereof. (2) Background technology

[0002] Metal polishing is an important process of metal surface finishing, and the effect of metal polishing will directly affect the quality of metal surface finishing. Currently widely used metal polishing liquid, due to the larger particles of abrasives and the use of ionic surfactants as surfactants, when polishing metal surfaces, there are often more red rust, green rust, stains, and black discoloration layers. and other stains, the surface of the final product is not easy to clean; especially under medium and low temperature conditions, the use effect is even worse. (3) Contents of the invention

[0003] The object of the present invention is to overcome the shortcomings of the existing metal polishing liquid, and provide a metal polishing liquid with high effi...