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Metal polish liquid, and prepartion method

A polishing liquid and metal technology, applied in polishing compositions, chemical instruments and methods, polishing compositions containing abrasives, etc., can solve the problems of poor use effect, difficult cleaning of product surface, and many black discoloration layers, etc. The effect of less sticking, good effect and fast polishing rate

Inactive Publication Date: 2007-12-26
天津晶岭电子材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Currently widely used metal polishing liquid, due to the larger particles of abrasives and the use of ionic surfactants as surfactants, when polishing metal surfaces, there are often more red rust, green rust, stains, and black discoloration layers. and other stains, the surface of the final product is not easy to clean; especially under medium and low temperature conditions, the use effect is even worse

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] A kind of metal polishing liquid, is made up of water-soluble silica sol, alkyl alcohol amide, alcohol amine, hexahydroxypropyl propylenediamine and deionized water, and the percentage by weight of various components is: water-soluble silica sol 20%, particle diameter 20-30nm; Alkanolamide 0.3%; Alcoholamine 2%; Hexahydroxypropylpropylenediamine 0.6%; Deionized water is the balance. The preparation method of the polishing liquid is: firstly filter and purify the various components of the prepared polishing liquid, and then pass the various components through the mass The flow meter is input into the container tank and stirred thoroughly, and the mixture is uniform. Dilute the above polishing liquid and deionized water by 1:10, and experiment on Lanxin X62 815-1 single-side polishing machine: at 300g / cm 2 , 40±5°C, 3L±0.3L / min, the coated copper metal is polished at a rate of 0.05μ / min.

Embodiment 2

[0016] A polishing fluid for metals consisting of CeO 2 Hydrosol, fatty alcohol polyoxyethylene ether, sodium hydroxide, tetrahydroxyethylethylenediamine and deionized water, the weight percentage of various components is: CeO 2 30% hydrosol, particle size 30nm-40nm; fatty alcohol polyoxyethylene ether 0.4%; tetramethylamine hydroxide 1%; tetrahydroxyethylethylenediamine 0.9%; deionized water as the balance. The preparation method of the polishing liquid is the same as in Example 1. Dilute the above polishing liquid and deionized water by 1:10, and experiment on Lanxin X62 815-1 single-side polishing machine: at 300g / cm 2 , 40±5°C, 3L±0.3L / min, the coated copper metal was polished at a rate of 0.1μ / min.

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Abstract

This invention relates to a metal polishing solution, which is composed of: abrasive material 10-50 wt. %, surfactant 0.1-1 wt. %, pH regulator 1-5 wt. %, chelating agent 0.1-1 wt. %, and deionized water as balance. The granularity of the abrasive material is 15-100 nm. The pH value of the metal polishing solution is 8-12. The metal polishing solution is prepared by: filtering and purifying the above components of the metal polishing solution, introducing the components into a container through a mass flowmeter under negative pressure in a class 1000 clean room, and stirring uniformly. The metal polishing solution has such advantages as high polishing speed, high smoothness, small diameters, and little damage to wafer surface, wasy cleaning, no toxicity, no odor, no corrosion, simple process and easy operation.

Description

(1) Technical field [0001] The invention relates to a polishing liquid and a preparation method thereof, in particular to a metal polishing liquid and a preparation method thereof. (2) Background technology [0002] Metal polishing is an important process of metal surface finishing, and the effect of metal polishing will directly affect the quality of metal surface finishing. Currently widely used metal polishing liquid, due to the larger particles of abrasives and the use of ionic surfactants as surfactants, when polishing metal surfaces, there are often more red rust, green rust, stains, and black discoloration layers. and other stains, the surface of the final product is not easy to clean; especially under medium and low temperature conditions, the use effect is even worse. (3) Contents of the invention [0003] The object of the present invention is to overcome the shortcomings of the existing metal polishing liquid, and provide a metal polishing liquid with high effi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02C09G1/14
Inventor 仲跻和李家荣周云昌班冬青
Owner 天津晶岭电子材料科技有限公司
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