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ITO line chemical nickel and gold process

An electroless nickel-gold and chemical-gold technology, applied in the field of ITO circuit electroless nickel-gold process, can solve the problem of lack of uniformity of gold plating precipitation speed and final plating layer, poor signal transmission capability of ITO circuit plating layer, high wiring design cost and high etching cost. problems, to achieve the effect of stable and excellent quality, excellent signal transmission ability, good plating ability and stability

Inactive Publication Date: 2018-06-05
苏州联卓电子有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The four sides of the capacitive touch screen are covered with nano-indium tin oxide (ITO) wiring, which needs to be processed by a complex sputtering process to form a metal film on the ITO wiring, and its manufacturing cost is high
[0003] In the prior art, the ITO circuit on the edge of the capacitive touch screen is gold-plated. One is to use the electroplating method to carry out gold plating. For example, the Chinese patent with the publication number CN101706703A discloses a method for making a metal film on the four sides of the capacitive touch screen. The electroless gold plating process is relatively complicated, consumes a lot of energy, and has certain pollution
[0004] The second is to adopt chemical gold plating, such as the Chinese patent whose publication number is CN101845625A, which discloses a method for carrying out chemical gold plating on the surface of a capacitive touch screen. When using this method, the consistency of gold plating precipitation speed and the uniformity of the final coating are lacking. It is difficult to avoid the problem of bridging connection of ITO line parts and inconsistent thickness of coating, which makes the signal transmission ability of ITO line coating poor, and it is easy to be damaged and mottled. Production Control
This method ensures that the plating layer is uniform from the wiring method of the chemical gold plating TIO, the wiring design cost and the etching cost are high, and there is no breakthrough in the actual production process, which lacks practicability

Method used

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Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment 1

[0026] A. Degreasing: The ITO glass substrate is cleaned and degreased in an alkaline cleaner at a temperature of 50°C for 4 minutes;

[0027] B. Hot water washing: Wash the ITO glass substrate with hot water at a temperature of 50°C for 1 minute, then wash it twice with pure water at room temperature for 0.5 minutes each time, and dry it;

[0028] C. Micro-etching: The middle part of the ITO glass substrate is pasted with an insulating film to expose the surrounding edges, and it is etched and roughened in a micro-etching agent at a temperature of 27°C for 4 minutes, and then washed twice with pure water at room temperature, each time Time 0.5 minutes, drying;

[0029] D. Activation: The ITO glass substrate is subjected to Pd deposition and activation treatment in a palladium activator at a temperature of 22°C for 4 minutes, then washed twice with pure water at room temperature for 0.5 minutes each time, and dried;

[0030] E. Post dipping: Soak the ITO glass substrate in th...

specific Embodiment 2

[0034] A. Degreasing: The ITO glass substrate is cleaned and degreased in an alkaline cleaner at a temperature of 45°C for 6 minutes;

[0035] B. Hot water washing: Wash the ITO glass substrate with hot water at a temperature of 45°C for 2 minutes, then wash it twice with pure water at room temperature for 1 minute each time, and dry it;

[0036] C. Micro-etching: The middle part of the ITO glass substrate is pasted with an insulating film to expose the surrounding edges, and it is etched and roughened in a micro-etching agent at a temperature of 25°C for 6 minutes. After that, it is washed twice with pure water at room temperature. Time 1 minute, dry;

[0037] D. Activation: The ITO glass substrate is subjected to Pd deposition and activation treatment in a palladium activator at a temperature of 20°C for 6 minutes, then washed twice with pure water at room temperature for 1 minute each time, and dried;

[0038] E. Post-dipping: ITO glass substrates are soaked in the post-di...

specific Embodiment 3

[0042] A. Degreasing: The ITO glass substrate is cleaned and degreased in an alkaline cleaner at a temperature of 48°C for 5 minutes;

[0043] B. Hot water washing: Wash the ITO glass substrate with hot water at a temperature of 50°C for 1 minute, then wash it twice with pure water at room temperature for 1 minute each time, and dry it;

[0044] C. Micro-etching: The middle part of the ITO glass substrate is pasted with an insulating film to expose the surrounding edges. Etching and roughening are performed in a micro-etching agent at a temperature of 25°C for 5 minutes. After that, it is washed twice with pure water at room temperature. Time 1 minute, dry;

[0045] D. Activation: The ITO glass substrate is subjected to Pd deposition and activation treatment in a palladium activator at a temperature of 20°C for 5 minutes, then washed twice with pure water at room temperature for 1 minute each time, and dried;

[0046] E. Post dipping: Soak the ITO glass substrate in the post di...

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PUM

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Abstract

The invention discloses an ITO line chemical nickel and gold process which comprises the following steps: degreasing, micro-etching, activating, post-immersing, nickel-plating and gold-plating. As a whole, the process realization difficulty is moderate, the pollution is low, a finished product plating layer is uniform and stable in performance, the multiple performance requirements of customers, such as oxidation resistance and abrasion resistance are met, and the stable quality and the excellent signal transmission capability of a capacitive touch screen are ensured. The ITO line chemical nickel and gold process disclosed by the invention is suitable for ITO line chemical nickel and gold.

Description

technical field [0001] The invention relates to the field of ITO line chemical nickel gold, in particular to an ITO line chemical nickel gold process. Background technique [0002] The four sides of the capacitive touch screen are covered with nano-indium tin oxide (ITO) wiring, which needs to be processed by a complex sputtering process to form a metal film on the ITO wiring, and its manufacturing cost is high. [0003] In the prior art, the ITO circuit on the edge of the capacitive touch screen is gold-plated. One is to use the electroplating method to carry out gold plating. For example, the Chinese patent with the publication number CN101706703A discloses a method for making a metal film on the four sides of the capacitive touch screen. The electroless gold plating process is relatively complicated, consumes a lot of energy, and has certain pollution. [0004] The second is to adopt chemical gold plating, such as the Chinese patent whose publication number is CN10184562...

Claims

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Application Information

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IPC IPC(8): C23C18/36C23C18/42C23C18/18
CPCC23C18/36C23C18/1893C23C18/42
Inventor 于中生
Owner 苏州联卓电子有限公司
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