Method of measuring concentration of fe in p-type silicon wafer
A concentration measurement, p-type silicon technology, applied in the direction of measuring electricity, measuring devices, measuring electrical variables, etc., can solve the problems of high detection limit of Fe concentration, unable to reduce the detection limit of Fe concentration, etc., and achieve the effect of reducing the detection limit
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experiment example 1
[0052] (Experimental Example 1: Standard Mode)
[0053] The FAaST330 manufactured by Semilab-SDi LLC was used as the SPV device, the CF was fixed at 1584Hz, the light intensity was fixed at level 3, and NR, TC, and TB were set to various values shown in Table 1, and carried out in the standard mode. SPV measurement. The irradiation wavelengths were set to 780 nm and 1004 nm.
[0054] The detection lower limit of the Fe concentration was determined by the following method. As a blank wafer, according to the description of Japanese Patent Application Laid-Open No. 2011-054784, a boron-doped p-type silicon wafer in the separation of Fe-B pairs was prepared, and after HF treatment was performed on nine points in the plane of the wafer, the SPV measurement. The minority carrier diffusion length obtained here is regarded as the minority carrier diffusion length L in the normal state FeB . Next, the silicon wafer was irradiated with a flash lamp 12 times at intervals of 5 seco...
experiment example 2
[0067] (Experimental Example 2: Extreme Mode)
[0068] FAaST330 manufactured by Semilab-SDi LLC was used as the SPV device, CF1 was set to 1584 Hz, CF2 was set to 1634 Hz, the light intensity was fixed at level 3, and NR, TC, and TB were set to various values shown in Table 2. SPV measurements were performed in limit mode. The irradiation wavelengths were set at 780 nm and 1004 nm. The lower limit of detection of the Fe concentration and the treatment time were obtained in the same manner as in Experimental Example 1, and the results are shown in Table 2. The judgment results are also shown in Table 2 on the same basis. And, according to the measurement result of Table 2, the relation between the lower limit of detection of Fe concentration and processing time is also shown together in the figure 2 middle.
[0069] [Table 2]
[0070]
[0071] From Table 2 and figure 2 It can be clearly seen that in the limit mode, when NR, TC, and TB are the same as those of conve...
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