A kind of phosphorus-containing active ester and its halogen-free composition and copper clad substrate
A technology of active ester and resin composition, which is applied in the field of laminates and printed circuit boards, prepregs, phosphorus-containing active ester and its halogen-free resin composition, and can solve the problems of poor dielectric properties, large water absorption, and impact on Problems such as board performance, to achieve the effect of satisfying halogen-free flame retardancy, reducing dielectric loss factor, and improving the electrical properties of the system
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Synthetic example 1
[0057] Add 160g (0.5mol) 10-(2,5-dihydroxyphenyl)-10-hydrogen-9-oxa-10- Phosphaphenanthrene-10-oxide (ODOPB) and 360g hydroxyl-containing phenoxy cyclotriphosphazene (wherein the dihydroxy content is greater than 60%) and 816g methyl isobutyl ketone (MIBK), nitrogen replacement under reduced pressure in the system , to dissolve it. Then, 182.7g (0.9mol) of terephthaloyl chloride was put into the reaction for 2 hours, and the temperature in the system was controlled below 60°C; then, 114g (1.2mol) of phenol was added to the system, and the reaction was continued for 1 hour; 189 g of 20% aqueous sodium hydroxide solution are added; stirring is continued for 1 hour under these conditions. After the reaction was completed, the water layer was removed by static liquid separation. Add water into the MIBK phase in which the reactants are dissolved, stir and mix, then separate the liquids at rest, and remove the water layer. The above operations were repeated until the pH of the aq...
Synthetic example 2
[0059] Add 185g of 10-(2,5-dihydroxynaphthyl)-10-hydrogen-9-oxa-10-phosphaphenanthrene-10 to a flask equipped with a thermometer, dropping funnel, condenser, fractionating tube, and stirrer -Oxide and 360g of hydroxyl-containing phenoxy cyclotriphosphazene (wherein the dihydroxyl content is greater than 60%) and 816g of methyl isobutyl ketone (MIBK), nitrogen replacement under reduced pressure in the system to make it dissolve. Then, 182.7g (0.9mol) of terephthaloyl chloride was put into the reaction for 2 hours, and the temperature in the system was controlled below 60°C; then, 114g (1.2mol) of phenol was added to the system, and the reaction was continued for 1 hour; 189 g of 20% aqueous sodium hydroxide solution are added; stirring is continued for 1 hour under these conditions. After the reaction was completed, the water layer was removed by static liquid separation. Add water into the MIBK phase in which the reactants are dissolved, stir and mix, then separate the liquid...
Synthetic example 3
[0061] The product of DOPO and phenylbenzoquinone through addition reaction or recrystallized in ethoxyethanol to obtain 10-(2,5-dihydroxybiphenyl)-10-hydrogen-9-oxa-10-phosphorus Heterophenanthrene-10-oxide.
[0062] Add 190g of 10-(2,5-dihydroxybiphenyl)-10-hydrogen-9-oxa-10-phosphaphenanthrene- 10-Oxide, 360g hydroxyl-containing phenoxycyclotriphosphazene (wherein the dihydroxyl content is greater than 60%) and 816g methyl isobutyl ketone (MIBK), nitrogen replacement in the system under reduced pressure to dissolve. Then, 182.7g (0.9mol) of terephthaloyl chloride was put into the reaction for 2h, and the temperature in the system was controlled below 60°C; then, 114g (1.2mol) of phenol was added to the system, and the reaction was continued for 1h; 189 g of 20% aqueous sodium hydroxide solution are added dropwise; stirring is continued under these conditions for 1 hour. After the reaction was completed, the water layer was removed by static liquid separation. Add water i...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com