Comprehensive depositing and coating device and comprehensive coating method

A technology of coating equipment and deposition rate, applied in the field of optical thin films, can solve the problems of reducing film performance, reducing coating efficiency, and increasing coating cost, so as to achieve the effect of improving performance, improving coating efficiency and reducing coating cost.

Active Publication Date: 2018-07-31
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

On the one hand, this method will greatly increase the probability of defects inside the component during the multiple loading, taking and vacuuming processes, thereby reducing the performance of the film layer; on the other hand, due to the need for multiple pumping Vacuum reduces coating efficiency and increases coating cost

Method used

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  • Comprehensive depositing and coating device and comprehensive coating method

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Embodiment Construction

[0024] The present invention will be further described below in conjunction with the embodiments and accompanying drawings.

[0025] Please see first figure 1 , figure 1 It is a schematic structural diagram of the electron beam evaporation, ion beam assisted and ion beam sputtering comprehensive deposition and coating equipment of the present invention. It can be seen from the figure that the electron beam evaporation, ion beam assisted and ion beam sputtering comprehensive deposition and coating equipment of the present invention includes a coating machine , the left electron gun crucible 2, the right electron gun crucible 3, the ion auxiliary source 4, the ion main source 5, the sputtering target material 6 and the fixture disc 7 are set in the same vacuum chamber 1, the left electron gun 2 and the right electron gun 3 They are respectively located at the left front part and the right front part of the bottom of the vacuum chamber 1, the ion auxiliary source 4 is located at...

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Abstract

The invention relates to a comprehensive depositing and coating device and a comprehensive coating method integrating electron beam evaporation, ion beam assistance and ion beam sputtering. The devicecomprises a comprehensive depositing system formed by a left electronic gun crucible, a right electronic gun crucible, an ion source auxiliary source, an ion source main source, a sputtering target material and a fixture plate. According to the comprehensive depositing and coating device and the comprehensive coating method provided by the invention, the advantages of an electron beam evaporationand deposition technology, an ion beam assistance deposition technology and an ion beam sputtering deposition technology are combined, so that the quality of a coating can be improved, the coating efficiency can be improved, and the coating cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, in particular to an electron beam evaporation, ion beam assist and ion beam sputtering comprehensive deposition and coating equipment and a comprehensive coating method. Background technique [0002] Electron beam evaporation deposition technology, ion beam assisted deposition technology, and ion beam sputtering deposition technology are currently widely used thin film deposition technologies. Electron beam evaporation deposition technology is widely used in the preparation of laser thin film components because it is easy to obtain a high laser damage threshold and is easy to expand for the preparation of large-scale thin film components, such as the US National Ignition Device and my country’s Shenguang series devices. Large-scale laser thin film components such as transmission mirrors are prepared by electron beam evaporation deposition technology. Ion beam assisted deposition techno...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/30C23C14/46
CPCC23C14/30C23C14/46
Inventor 朱美萍曾婷婷邵建达易葵孙建李静平王建国张伟丽
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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