Atmospheric pressure plasma coating device
A technology of atmospheric pressure plasma and coating equipment, which is applied in the direction of plasma, gaseous chemical plating, coating, etc., and can solve problems affecting the quality of film formation
Active Publication Date: 2020-06-26
CREATING NANO TECH INC
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Problems solved by technology
Therefore, it can not only effectively improve the mixing uniformity of coating precursors and plasma, reduce excessive deposition of precursors and plasma in closed channels, but also greatly improve the problem of waste caused by coating precursors escaping into the atmosphere
[0006] Another object of the present invention is to provide an atmospheric pressure plasma coating device, which does not have a closed channel to guide the mixing of the coating precursor and the plasma, so it can solve the deposition pollution caused by the known technique of using a closed channel to inject the coating precursor into the plasma chamber In turn, the problem that affects the quality of the film can be improved, and the uniformity of spraying can be improved, thereby improving the quality of the coating
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[0020] Please refer to figure 1 , which is a device schematic diagram illustrating an atmospheric pressure plasma coating device according to an embodiment of the present invention. In this embodiment, the atmospheric pressure plasma coating device 100 mainly includes an atmospheric pressure plasma generator 110 and at least one precursor feeding fixture 120 . In some embodiments, the atmospheric pressure plasma generator 110 mainly includes a tubular electrode 112 and a nozzle 114 . The tubular electrode 112 has a chamber 112a. In some exemplary examples, the atmospheric pressure plasma generator 110 further includes a rod-shaped electrode 116 , wherein the rod-shaped electrode 116 is disposed in the chamber 112 a of the tubular electrode 112 . Two poles of the power supply 130 are respectively electrically connected to the tubular electrode 112 and the rod-shaped electrode 116 , so that there is a potential difference between the tubular electrode 112 and the rod-shaped el...
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An atmospheric-pressure plasma coating device is provided that includes an atmospheric-pressure plasma generator and at least one precursor feeding fixture. The atmospheric-pressure plasma generator comprises a tubular electrode and a nozzle. The nozzle is disposed below the tubular electrode and is configured to eject plasmas. The nozzle has a spout and a smooth profile, and the outer diameter ofthe smooth profile is tapered from the tubular electrode toward the spout. The at least one precursor feeding fixture is disposed adjacent to the tubular electrode and the nozzle, and is configured to spray a coating precursor toward the smooth contour of the nozzle, so that the coating precursor flows along the smooth contour to the front of the nozzle to be sprayed with the atmospheric-pressureplasma to form a film . The smooth contour design of the nozzle, in combination with the suction generated by the plasma gas flow near the nozzle, can effectively improve the mixing uniformity of thecoating precursor and the plasma, improves the coating quality, and improves a waste caused by dispersing the coating precursor to the atmosphere.
Description
technical field [0001] The present invention relates to a plasma device, and in particular to an atmospheric pressure plasma coating device. Background technique [0002] Atmospheric pressure plasma torch devices are usually composed of tubular electrodes with high potential difference, which ionize the working gas to generate plasma, and connect nozzles under the tubular electrodes to eject the plasma torch stably. The atmospheric pressure plasma coating device applies a high-voltage electric field between its two electrodes under atmospheric pressure, first ionizes the working gas to generate plasma, and deposits the coating precursor and plasma on the substrate to form a film. Atmospheric pressure plasma coating technology can replace the vacuum plasma coating technology which is extremely expensive and has complicated maintenance procedures. In addition, the mass production process of atmospheric pressure plasma coating technology is continuous, so it can reduce the lab...
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IPC IPC(8): C23C16/455C23C16/54C23C16/50H05H1/34
CPCC23C16/4401C23C16/455C23C16/45563C23C16/50C23C16/54H05H1/34
Inventor 王齐中徐逸明
Owner CREATING NANO TECH INC