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One-dimensional X-ray multilayer film waveguide structure and its preparation method

A technology of a waveguide structure and a multi-layer film is applied to the field of a one-dimensional X-ray multi-layer film waveguide structure and its preparation, which can solve the problems of low transmittance and X-ray loss, and achieves guaranteed transmittance, improved focus signal-to-noise ratio, Ensure the concentrated effect of X-ray intensity

Active Publication Date: 2018-09-25
上海米蜂激光科技有限公司
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The reason is that there is a large amount of loss of X-rays in the waveguide structure, so the transmittance is low

Method used

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  • One-dimensional X-ray multilayer film waveguide structure and its preparation method
  • One-dimensional X-ray multilayer film waveguide structure and its preparation method
  • One-dimensional X-ray multilayer film waveguide structure and its preparation method

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preparation example Construction

[0049] The above molybdenum / carbon aperiodic multilayer film was prepared by using DC magnetron sputtering technology (Wang Fengli, Wang Zhanshan, Zhang Zhong, Wu Wenjuan, Wang Hongchang, Zhang Shumin, Qin Shuji, Chen Lingyan, 13 (2005) 28-33), ( Xu Yao, Wang Zhanshan, Xu Jing, Zhang Zhong, Wang Hongchang, Zhu Jingtao, Wang Fengli, Wang Bei, Qin Shuji, Chen Lingyan, 15 (2007) 1838-1843). Molybdenum / carbon aperiodic multilayer film samples were obtained by alternately depositing molybdenum thin films and carbon thin films on germanium substrates.

[0050] After the deep processing of the molybdenum / carbon non-periodic multilayer film, the X-ray multilayer film waveguide is prepared. The steps are as follows, see attached figure 2 , step A, further processing the obtained multilayer film sample, and coating the sample film with an anti-electron beam film; step B, using electron beam etching (E-beam) to etch a fixed width Lc at a specific position; step C , use ion beam etchin...

Embodiment 1

[0058] Firstly, the relationship between the waveguide emission phase and the thickness of a single conducting layer is solved. Set the X-ray multilayer film waveguide to work at 19.9 keV energy, according to the calculation method of X-ray propagation in a single channel (C. Fuhse, T. Salditt, Physica B, 357 (2005) 57-60), through the X Solving the Helmholtz equation of the ray at the entrance of the waveguide, the relationship formula between the propagation constant β and the thickness d of the guiding layer is obtained, , where k0 is the wave vector in vacuum, n1 is the refractive index of the carbon film, and ξ is the eigenvalue of the Helmholtz equation. The Taylor formula is used to expand this formula to obtain the relationship between the small amount of thickness Δd and the small amount of propagation constant Δβ.

[0059]

[0060] in is the waveguide parameter, n1 is the refractive index of the carbon film, n2 is the refractive index of the molybdenum film, ...

Embodiment 2

[0068] Firstly, the relationship between the waveguide emission phase and the thickness of a single conducting layer is solved. Set the X-ray multilayer film waveguide to work at 19.9 keV energy, according to the calculation method of X-ray propagation in a single channel (C. Fuhse, T. Salditt, Physica B, 357 (2005) 57-60), through the X Solving the Helmholtz equation of the ray at the entrance of the waveguide, the relationship formula between the propagation constant β and the thickness d of the guiding layer is obtained, , where k0 is the wave vector in vacuum, n1 is the refractive index of the carbon film, and ξ is the eigenvalue of the Helmholtz equation. The Taylor formula is used to expand this formula to obtain the relationship between the small amount of thickness Δd and the small amount of propagation constant Δβ.

[0069]

[0070] in is the waveguide parameter, n1 is the refractive index of the carbon film, n2 is the refractive index of the molybdenum film, ...

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Abstract

The invention relates to the technical field of precision optical components, in particular to a one-dimensional X-ray multi-layer film waveguide structure and a preparation method thereof. The waveguide structure comprises a base, a top substrate and a molybdenum / carbon aperiodic multi-layer film arranged between the base and the top substrate, the molybdenum / carbon aperiodic multi-layer film iscomposed of staggeredly arranged molybdenum thin film layers and carbon thin film layers, a clearance is formed in the surface of the side, relative to the top substrate, of the molybdenum / carbon aperiodic multi-layer film, and the molybdenum / carbon aperiodic multi-layer film is separated into a first waveguide layer and a second waveguide layer. Compared with the prior art, the input aperture ofX-ray can be improved by utilizing multiple conductive layers in the multi-layer film, and the size of a focus can be changed and background noise can be reduced by utilizing the lengths and etching lengths of the first waveguide layer and the second waveguide layer to further improve the focusing performance of the waveguide focus of the X-ray, and the design provides an effective method for further expanding extensive application of the X-ray multi-layer film waveguide.

Description

technical field [0001] The invention relates to the technical field of precision optical components, in particular to a one-dimensional X-ray multilayer film waveguide structure and a preparation method thereof. Background technique [0002] The performance and interconnection of nanoscale biological structures are the focus of research in the field of life sciences. In the field of life sciences, the functions and cluster effects of biological molecules have made great progress, but the three-dimensional structure of nanoscale biological structures However, the development of imaging is slow, the main reason is the limitation of three-dimensional imaging technology. Nowadays, the analysis methods used for nanoscale structure imaging mainly include scanning electron microscope analysis, transmission electron microscope analysis and fluorescence analysis. The first two analysis methods can well display the two-dimensional biological structure, but at the same time it will ca...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21K1/06
CPCG21K1/062G21K1/065
Inventor 钟奇谢雨江
Owner 上海米蜂激光科技有限公司