Method for preparing bismuth nanoparticles on oxide substrate

A bismuth nanometer and oxide technology, which is applied in the field of photocatalytic materials, can solve the problems of low density, uneven particle size and serious agglomeration of Bi nanoparticles, and achieves the effect of simple and easy preparation method, overcoming low density and easy realization.
CN108554401AActive Publication Date: 2018-09-21SHAANXI UNIV OF SCI & TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHAANXI UNIV OF SCI & TECH
Publication Date
2018-09-21

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Abstract

The invention discloses a method for preparing bismuth nanoparticles on an oxide substrate. The method comprises the following steps: uniformly mixing SrBi2Nb2O9 with NaBH4, calcining for 1-5 hours at300-800 DEG C in the presence of an inert atmosphere, washing, and drying, thereby obtaining the bismuth nanoparticles on the oxide substrate. In the presence of a reducing agent and an Ar atmosphere, non-noble metal Bi nanoparticles with high density, single dispersion and uniform and controllable particle sizes are grown in situ on the surface of SrBi2Nb2O9 with a semimetal Bi as a raw materialby using a calcining method, and in addition, the particle size of the Bi nanoparticles is 3-7 nm.
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Description

Technical field

[0001] The invention belongs to the field of photocatalytic materials, and relates to a method for preparing bismuth nanoparticles on an oxide substrate. Background technique

[0002] Metal nanoparticles (NPs) have attracted great attention due to their unique properties and wide applications. Semi-metal Bi is a type of photocatalytic material used in photocatalytic technology. Due to its stable chemical properties, low cost and easy availability, non-toxicity, and excellent electron transport capabilities, it is considered to be the most promising material in photocatalytic technology. . However, in the reported Bi / semiconductor heterojunction system, there is little research work on the formation of Bi / semiconductor heterojunction by in-situ growth of Bi nanoparticles based on Bi-based semiconductor materials. Moreover, in the reported Bi / semiconductor heterojunction system, Bi nanoparticles mostly have low density, serious agglomeration, and uneven particle s...

Claims

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