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Surface-enhanced Raman scattering substrate, manufacturing technology and application

A surface-enhanced Raman and spectroscopy technology, which is applied in Raman scattering, material analysis through optical means, measurement devices, etc., can solve the problem of low enhancement factor and achieve the effect of electric field intensity enhancement

Inactive Publication Date: 2018-09-28
SHENZHEN TOPMEMBRANES INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to overcome the deficiencies of the prior art, the present invention proposes a surface-enhanced Raman spectroscopy substrate, manufacturing process and application, the purpose of which is to solve the problem of preparing a metal nanoparticle array on the substrate as a SERS substrate enhancement factor by using a traditional single-layer ultra-thin anodized aluminum template. relatively low problem

Method used

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  • Surface-enhanced Raman scattering substrate, manufacturing technology and application
  • Surface-enhanced Raman scattering substrate, manufacturing technology and application
  • Surface-enhanced Raman scattering substrate, manufacturing technology and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] S1. Providing a silicon substrate, the silicon substrate has a first surface;

[0058] S2. Forming a superimposed first template layer 201 and an uppermost second template layer 202 on the first surface of the silicon substrate by an oxidation method, the first template layer 201 and the hole centers of the uppermost second template layer 202 The spacing is 100nm, the hole diameter is 90nm, and the thickness of the anodic porous alumina template layer 20 is 130nm;

[0059] S3. Deposit silver with a thickness of 25 nm on the first template layer 201 and the second template layer 202 by electron beam evaporation method; keep the anodic porous aluminum oxide template layer to obtain a surface-enhanced Raman spectroscopy substrate.

[0060] in:

[0061] figure 2 (a) and (b) are scanning electron micrographs after forming two layers of anodic porous alumina template layers on the silicon substrate; figure 2 (c) and (d) are scanning electron micrographs of the structure ...

Embodiment 2

[0065] S1. A quartz glass substrate is provided, and the quartz glass substrate has a first surface;

[0066]S2. Two layers of superimposed anodic porous alumina template layers are formed on the first surface of the quartz glass substrate by an oxidation method. The hole center distance of the anodic porous alumina template layer is 500nm, the hole diameter is 450nm, and the template thickness is 300nm.

[0067] S3. Deposit gold with a thickness of 100 nm on the double-layer anodic porous alumina template layer by thermal evaporation method; keep the anodic porous alumina template layer to obtain a surface-enhanced Raman spectrum substrate.

[0068] According to the above examples, it can be seen that the intensity of the surface-enhanced Raman spectrum substrate obtained by adopting the technical solution is higher than that of the traditional one.

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Abstract

The invention discloses a surface-enhanced Raman scattering substrate, a manufacturing technology and application. The surface-enhanced Raman scattering substrate comprises a target substrate layer, an anode porous aluminium oxide template layer and active metal particles; the target substrate layer is provided with a first surface; the anode porous aluminium oxide template layer is formed on thefirst surface of the target substrate layer; the active metal particles are non-continuously dispersed on the first surface of the anode porous aluminium oxide template layer or / and the target substrate layer. According to the technical scheme, the surface-enhanced Raman scattering substrate comprises the anode porous aluminium oxide template layer and the non-continuously-distributed active metalparticles, multiple through holes are formed in the anode porous aluminium oxide template layer, therefore the distribution position of the active metal particles is changed, distribution of a peripheral electric field of the active metal particles is changed accordingly, the intensity of an electric field close to the surfaces of the active metal particles is obviously improved, and finally theRaman intensity of the Raman scattering substrate is improved.

Description

technical field [0001] The invention relates to the technical field of Raman spectroscopy substrates, in particular to a surface-enhanced Raman spectroscopy substrate, manufacturing process and application. Background technique [0002] Surface-Enhanced Raman Spectroscopy (Surface-Enhanced Ramans Cattering, SERS) technology has huge potential in the fields of food safety, medical testing, and environmental pollutant detection because it can provide molecular fingerprint information, fast detection speed, high sensitivity and accuracy. potential application value. The performance requirements of the commercialized SERS substrate are not only high surface enhancement factor, but also good uniformity and repeatability, convenient use and low cost. In recent years, a large number of SERS substrates prepared by different methods have emerged. Among them, the use of metal direct evaporation to prepare SERS substrates has been widely studied and applied because of its simple steps...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65G01N21/01
CPCG01N21/01G01N21/658
Inventor 赵呈春郭秋泉祝渊桂许春杨军
Owner SHENZHEN TOPMEMBRANES INC