Dual-photon polymerization and exposure-based parallel photoetching system and method
A technology of two-photon polymerization and lithography system is applied in the field of parallel lithography system based on two-photon polymerization and exposure, which can solve the problem of high cost and achieve the effects of simple production, low price and cost reduction.
Inactive Publication Date: 2018-10-26
杭州志英科技有限公司
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[0007] Aiming at the problem of high cost in the prior art when a pure phase-type spatial light modulator is used for two-photon polymerization exposure parallel lithography, the present invention provides a parallel lithography system based on two-photon polymerization exposure, which can Enables fast, parallel two-photon polymerization exposure lithography at low cost
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[0061] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be pointed out that the following embodiments are intended to facilitate the understanding of the present invention and do not have any limiting effect on it.
[0062] There are three design schemes for the light source module, which correspond to the three types of volume holographic optical element manufacturing processes. The three volume holographic element manufacturing methods are as follows:
[0063] figure 1 Schematic diagram for the production of reflective volume holographic optical elements. The light emitted by the laser passes through the optical fiber Of 1 And Of 2 Divided into two ways, of which Of 2 The port coordinates are R(x r , Y r ,z r ), the emitted divergent spherical wave illumination holographic dry plate (silver salt dry plate or photoresist plate) H, Of 1 The port coordinates are O(x o , Y o ,z o ), the light distribu...
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The invention discloses a dual-photon polymerization and exposure-based parallel photoetching system and method. The dual-photon polymerization and exposure-based parallel photoetching system comprises a light source module, a liquid crystal light valve, a two-dimensional scanning galvanometer module, a microscopy printing module and a computer, wherein the light source module comprises a femtosecond laser and a phase volume holographic optical component, the phase volume holographic optical component is used for modulating femtosecond laser emitted from the femtosecond laser so as to form a plurality of optical points arranged in a space lattice way, the liquid crystal light valve is used for loading a two-value mask image by the computer and controlling each optical point to be independently turned on and turned off, the two-dimensional scanning galvanometer module is used for scanning the optical point turned on by the liquid crystal light valve to the microscopy printing module, the microscopy printing module is used for layering and photoetching a light-sensitive material by the optical point scanned by the scanning galvanometer according to a three-dimensional nano structuredesigned by the computer, and the computer is used for controlling action of the liquid crystal light valve, the scanning galvanometer and the microscopy printing module. The invention also disclosesa method for performing parallel photoetching on the parallel photoetching system. By the parallel photoetching system, rapid and parallel dual-photon polymerization and exposure photoetching can be performed, and the cost is relatively low.
Description
Technical field [0001] The invention relates to the field of micro-nano structure lithography, in particular to a parallel lithography system and method based on two-photon polymerization exposure. Background technique [0002] Laser technology is one of the four major inventions in the 20th century that are as famous as atomic energy, semiconductors and computers. For more than 40 years, with the increasing demand for small electronic products and microelectronic components, precision processing of processing materials (especially polymer materials and high melting point materials) has gradually become the fastest growing laser in industrial applications One of the fields. Laser processing is an important application in the laser industry. Compared with conventional mechanical processing, laser processing is more precise, more accurate, and faster. [0003] Femtosecond laser lithography technology has the advantages of high processing accuracy, small thermal effect, low damage t...
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IPC IPC(8): G03F7/20G03F7/00
CPCG03F7/0037G03F7/70025G03F7/70066G03F7/70358G03F7/70416
Inventor 魏一振王洪庆杨鑫
Owner 杭州志英科技有限公司