Check patentability & draft patents in minutes with Patsnap Eureka AI!

Preparation method of SiO2 antireflective film with adjustable refractive index

An anti-reflection film and refractive index technology, applied in optics, instruments, optical components, etc., can solve the problems of small adjustment range of nanoparticle packing density and small adjustment range of refractive index, achieve excellent vacuum environment stability and improve mechanical strength , the effect of strong operability

Active Publication Date: 2018-11-06
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
View PDF3 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this film has an adjustable refractive index, the adjustment range of the packing density of the nanoparticles is small, resulting in a relatively small adjustment range of the refractive index.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of SiO2 antireflective film with adjustable refractive index
  • Preparation method of SiO2 antireflective film with adjustable refractive index
  • Preparation method of SiO2 antireflective film with adjustable refractive index

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0030] SiO with adjustable refractive index in the present invention 2 The preparation method of the anti-reflection film, the specific operation steps are as follows:

[0031] Step 1, Si (the total amount of Si in hexamethyldisilazane and ethyl orthosilicate), deionized water, absolute ethanol and NH with a molar ratio of 1:3.25:37.6:0.17 3 Mix, stir evenly and let it stand in a stable environment for about 20 days to obtain alkali-catalyzed SiO 2 Sol; SiO 2 The mass percent concentration of the sol is 3%, and before coating, the sol is diluted twice with absolute ethanol; in the above reaction system, ammonia water is the catalyst, and tetraethyl orthosilicate is SiO 2 Precursor, absolute ethanol as solvent, hexamethyldisilazane as organic modifier;

[0032] Step 2, immerse the pretreated substrate in the SiO 2...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a preparation method of a SiO2 antireflective film with an adjustable refractive index. The preparation method includes steps: simultaneously adding hexamethyldisilazane and tetraethoxysilane to a reaction solution as raw materials to synthesize SiO2 sol, and then plating a base-catalyzed SiO2 film on a substrate by employing a dip-coating method. According to the preparation method, the SiO2 film with a refractive index capable of large-range regulation and control can be further prepared, the preparation method is advantaged by simple process, high operability and fast reaction speed, the light transmittance of the prepared SiO2 antireflective film is high, and the stability is extremely excellent in a highly humid and hot environment; hexamethyldisilazane is regarded as the reaction raw material so that a microstructure of the film can be adjusted, and the regulation and control of the refractive index of the film can be realized; and when the proportion of hexamethyldisilazane is high, the mechanical strength (tension-compression strength) of the film can be effectively improved.

Description

technical field [0001] The invention relates to a SiO with adjustable refractive index 2 The invention discloses a method for preparing an anti-reflection film, belonging to the technical field of optical thin films. Background technique [0002] SiO 2 Anti-reflection coatings have been widely used in optical devices and energy fields to reduce the reflection of light. At present, the preparation methods of anti-reflection film mainly include vacuum evaporation, magnetron sputtering, sol-gel method and chemical vapor deposition method. Because the sol-gel method is simple, low in cost, and easy to combine with liquid deposition technology, this method is one of the most practical methods for preparing anti-reflection coatings. Therefore, in recent years, people have devoted themselves to the preparation of anti-reflection coatings by using the sol-gel method. Due to sol-gel SiO 2 Anti-reflection coatings have been widely studied and applied due to their excellent proper...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B1/113C03C17/25
CPCC03C17/25C03C2217/213C03C2217/732C03C2218/111C03C2218/113G02B1/113
Inventor 陶朝友张林邹鑫书严鸿维袁晓东
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More