Shared type VCSEL (vertical-cavity surface-emitting laser) and HBT (heterojunction bipolar transistor) integrated structure and manufacturing method
An n-type and p-type technology, applied in laser components, electrical components, lasers, etc., can solve problems such as low yield, difficulty in controlling etching depth, inability to provide current and light field limitations, etc., to reduce difficulty and improve finished products rate effect
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[0030] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.
[0031] Refer below figure 1 A shared VCSEL and HBT structure provided according to an embodiment of the present invention is described. It includes: a semi-insulating GaAs substrate 101, an unintentionally doped GaAs buffer layer 102, an unintentionally doped AlGaAs / AlAs lower DBR 103, an n-type InGaP emitter region 104, a p-type GaAs base region 105, and an n-type GaAs collector region 106, n-type InGaP corrosion barrier layer 107, upper and lower confinement layers 108, InGaAs / AlGaAs quantum well 109, Al 0.98 Ga 0.02As oxide layer 1...
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