Near-infrared narrow-band filter piece and infrared imaging system

A narrow-band filter, near-infrared technology, applied in the direction of filters, optics, optical components, etc., can solve the problems of poor imaging effect of near-infrared filters, and reduce the total thickness of the film layer, the total coating time, and hardness. High and good wear resistance

Pending Publication Date: 2018-11-23
XINYANG SUNNY OPTICAL CO LTD
View PDF0 Cites 29 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a near-infrared narrow-band filter and an infrared imaging system to solve the problem of poor imaging effect of the near-infrared filter

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Near-infrared narrow-band filter piece and infrared imaging system
  • Near-infrared narrow-band filter piece and infrared imaging system
  • Near-infrared narrow-band filter piece and infrared imaging system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0073] The first high-refractive-index film layer 121 and the first low-refractive-index film layer 122 are alternately plated to form an IR film system of a near-infrared narrow-band filter. In this embodiment, the first high refractive index film layer 121 is made of hydrogenated silicon (Si:H) material, and the first low refractive index film layer 122 is made of silicon nitride (i.e. SiN) material. m The form is arranged alternately to form the filter IR band-pass film system; wherein, L represents the height of the first low refractive index film layer 122 with a reference wavelength thickness of 1 / 4, and H represents the first high refractive index film layer 121 with a reference wavelength of 1 / 4 The height of the wavelength thickness, m represents the number of alternate plating.

[0074] In this embodiment, within the range where the incident angle changes from 0° to 10°, the central wavelength shift range of the passband band is between 0.5nm and 1.5nm, and every tim...

Embodiment 2

[0088] The first high-refractive-index film layer 121 and the first low-refractive-index film layer 122 are alternately plated to form an IR film system of a near-infrared narrow-band filter. In this embodiment, the first high refractive index film layer 121 is made of hydrogenated silicon (Si:H), and the first low refractive index film layer 122 is made of silicon nitride (i.e., Si:H). 3 N 4 ) material to L(HL) m The form is arranged alternately to form the filter IR band-pass film system; wherein, L represents the height of the first low refractive index film layer 122 with a reference wavelength thickness of 1 / 4, and H represents the first high refractive index film layer 121 with a reference wavelength of 1 / 4 The height of the wavelength thickness, m represents the number of alternate plating.

[0089] In this embodiment, within the range where the incident angle changes from 0° to 10°, the central wavelength shift range of the passband band is between 0.5nm and 1.5nm, a...

Embodiment 3

[0103] The first high-refractive-index film layer 121 and the first low-refractive-index film layer 122 are alternately plated to form an IR film system of a near-infrared narrow-band filter. In this embodiment, the first high refractive index film layer 121 is made of hydrogenated silicon (Si:H) material, and the first low refractive index film layer 122 is made of mixed materials, such as silicon nitride (SiN) and silicon dioxide (SiO 2 ) hybrid material, or silicon nitride (i.e. SiN and Si 3 N 4 ) mixed material, in L(HL) m The form is arranged alternately to form the filter IR band-pass film system; wherein, L represents the height of the first low refractive index film layer 122 with a reference wavelength thickness of 1 / 4, and H represents the first high refractive index film layer 121 with a reference wavelength of 1 / 4 The height of the wavelength thickness, m represents the number of alternate plating.

[0104] In this embodiment, within the range where the incident...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a near-infrared narrow-band filter piece and an infrared imaging system. The near-infrared narrow-band filter piece comprises a substrate and an IR film system arranged at oneside of the substrate. The IR film system consists of first high-refractive-index film layers and first low-refractive-index film layers that are plated alternately; and the first low-refractive-index film layer is arranged at the outermost layer of the IR film system. The IR film system has one passband band, two transition bands, and two cutoff bands in a wavelength range of from 800 to 1200 nm; the passband band is arranged between the two cutoff bands; and the transition bands are arranged between the passband band and the cutoff bands. The passband band has a central wavelength; and thedrift amplitude of the central wavelength of the passband band is between 7 nm and 13 nm within an incident angle changing range of from 0 degree to 30 degrees. Therefore, on the premise that the hightransmittance is guaranteed, the drift of the central wavelength of the passband of the narrow-band filter piece is reduced with the angle and the imaging quality is improved.

Description

technical field [0001] The invention relates to an optical filter and an infrared imaging system, in particular to a near-infrared narrow-band optical filter and an infrared imaging system. Background technique [0002] With the development of science and technology, face devices, gesture recognition, etc. Features. [0003] Near-infrared narrow-band filters are required for face recognition and gesture recognition, which can enhance the near-infrared light in the copper strip and cut off the visible light in the environment. Usually near-infrared narrow-band filters include two film systems, namely IR band-pass film system and long-wave pass AR film system. However, the optical filter in the prior art has poor anti-reflection effect on near-infrared light and visible light cut-off effect, and there is a problem that the thickness of the film system is relatively thick, which leads to the assembly of the optical filter in face recognition, gesture recognition, etc. After ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G02B1/10G02B1/115
CPCG02B5/208G02B1/10G02B1/115
Inventor 陈策丁维红肖念恭陈吉利
Owner XINYANG SUNNY OPTICAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap