A kind of polysiloxane resin for photosensitive solder resist white oil and its preparation method and application
A polysiloxane resin and photosensitive solder resist technology, which is applied in the field of photosensitive materials, can solve the problems of black non-sensitivity scratches, etc., and achieve the effects of reducing steric resistance, excellent anti-yellowing, and large molecular volume
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Embodiment 1
[0037] A preparation method of polysiloxane resin for photosensitive solder resist white oil, comprising the steps of:
[0038] (1) Synthetic polysiloxane resin prepolymer
[0039] Dissolve 5kg vinyl silicone oil (Dongguan Zhaoshun C-1), 28.3kg methyl methacrylate, 28.3kg ethyl methacrylate, 28.4kg butyl acrylate and 10kg glycidyl methacrylate (GMA) in 66kg solvent (Tetramethylbenzene:DBE=1:1), add 0.425kg AIBN to dissolve and mix, and react at 80°C for 8h to obtain a polysiloxane prepolymer.
[0040](2) Synthesis of photosensitive polysiloxane prepolymer
[0041] Add 3 kg of acrylic acid to the polysiloxane prepolymer prepared in step (1), and react at 120° C. for 3 hours to obtain a photosensitive polysiloxane prepolymer;
[0042] (3) Synthesis of alkali-soluble siloxane resin
[0043] Add 5.14kg of tetrahydrophthalic anhydride to the photosensitive polysiloxane prepolymer prepared in step (2), and react at 100°C for 6 hours to obtain the alkali-soluble polysiloxane resin...
Embodiment 2
[0045] A preparation method of polysiloxane resin for photosensitive solder resist white oil, comprising the steps of:
[0046] (1) Synthetic polysiloxane resin prepolymer
[0047] Dissolve 15kg vinyl silicone oil (Dongguan Zhaoshun C-1), 25kg methyl methacrylate, 25kg ethyl methacrylate, 25kg butyl acrylate and 10kg glycidyl methacrylate (GMA) in 66kg solvent (tetramethylbenzene :DBE=1:1), then add 0.75kg AIBN to dissolve and mix, and react at 100°C for 5h to obtain polysiloxane prepolymer.
[0048] (2) Synthesis of photosensitive polysiloxane prepolymer
[0049] Add 4.25 kg of acrylic acid to the polysiloxane prepolymer prepared in step (1), and react at 100° C. for 5 hours to obtain a photosensitive polysiloxane prepolymer;
[0050] (3) Synthesis of alkali-soluble siloxane resin
[0051] Add 9.1 kg of tetrahydrophthalic anhydride to the photosensitive polysiloxane prepolymer prepared in step (2), and react at 120°C for 6 hours to obtain the alkali-soluble polysiloxane re...
Embodiment 3
[0053] A preparation method of polysiloxane resin for photosensitive solder resist white oil, comprising the steps of:
[0054] (1) Synthetic polysiloxane resin prepolymer
[0055] Dissolve 30kg vinyl silicone oil (Dongguan Zhaoshun C-1), 20kg methyl methacrylate, 20kg ethyl methacrylate, 20kg butyl acrylate and 10kg glycidyl methacrylate (GMA) in 66kg solvent (tetramethylbenzene :DBE=1:1), then add 1.2kg AIBN to dissolve and mix, and react at 90°C for 6h to obtain polysiloxane prepolymer.
[0056] (2) Synthesis of photosensitive polysiloxane prepolymer
[0057] Add 5.58 kg of acrylic acid to the polysiloxane prepolymer prepared in step (1), and react at 110° C. for 4 hours to obtain a photosensitive polysiloxane prepolymer;
[0058] (3) Synthesis of alkali-soluble siloxane resin
[0059] Add 14.13 kg of tetrahydrophthalic anhydride to the photosensitive polysiloxane prepolymer prepared in step (2), and react at 110°C for 7 hours to obtain the alkali-soluble polysiloxane re...
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