Unlock instant, AI-driven research and patent intelligence for your innovation.

Charged particle microscope and sample image pickup method

A charged particle microscope and charged particle technology, applied in the direction of circuits, discharge tubes, electrical components, etc., can solve the problems that are not suitable for observing samples containing water

Inactive Publication Date: 2018-12-21
HITACHI HIGH-TECH CORP
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For this reason, the electron microscope is not suitable for observing samples containing water and samples whose morphology changes due to changes in air pressure.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Charged particle microscope and sample image pickup method
  • Charged particle microscope and sample image pickup method
  • Charged particle microscope and sample image pickup method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] figure 1 The structure of the scanning electron microscope of this Example is shown in . The scanning electron microscope is mainly composed of electron optical system, stage mechanism system, SEM control system, signal processing system and SEM operating system.

[0045] The electron optical system consists of an electron beam source 1 that generates electron beams, an optical lens 7 that focuses the generated electron beams and guides them to the lower part of the electron optical lens barrel 2 to focus on the sample as a primary electron beam, and conducts The scanning deflector 6 and other components are included, and these are accommodated in the electron optical column 2 . At the end of the electron beam optical column 2, a detector 8 for detecting emitted electrons obtained by irradiating the above-mentioned primary electron beam is disposed. The detector 8 may be outside or inside the electron beam optical column 2 . The electron optical column 2 may also inc...

Embodiment 2

[0096] In the above-described embodiment, when a voltage is applied to the upper electrode by the voltage application control unit, there is a possibility that a leakage current flows from the upper electrode to the lower electrode. In this embodiment, a method for reducing noise caused by such a leakage current will be described. Hereinafter, description of the same parts as in the first embodiment will be omitted.

[0097] In order to selectively acquire secondary electrons, it is necessary to apply a voltage of several V to several tens of V to the upper electrode or the lower electrode when the GAP of the sample is several tens of μm to several hundreds of μm. For example, if the sample GAP is 50 μm and the voltage is 5 V, an electric field of about 100 V / mm is generated. So, if Figure 9 As indicated by the arrow in (a), a leakage current occurs from the upper electrode to the lower electrode along the molecules in the atmosphere. If the magnitude of the leakage curren...

Embodiment 3

[0106] In the examples, a description will be given of a SEM structure in which a capsule-shaped sample unit is arranged in a vacuum-evacuated frame, and secondary electrons from a sample under atmospheric pressure can be selected and detected. The sample unit has a space in which a sample can be placed, and the inside of the sample unit can be made into an atmosphere of any gas type and pressure. In this embodiment, the interior of the sample cell is air.

[0107] Figure 12 A schematic diagram of the interior of the second housing 4 provided with the sample unit is shown in . The exterior of the second frame is due to the figure 1 are the same, so descriptions are omitted. The sample cell 50 is composed of the upper electrode 32 , the lower electrode 33 and the sealing material 44 . The sealing material 44 forms the side wall of the sample cell 50, seals the upper electrode 32 and the lower electrode 33, and maintains an atmospheric pressure space in the vacuum space. T...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention provides an electronic microscope capable of performing secondary electron image observation in the atmosphere, and an observation method. More specifically, this charged particle microscope has: a partition wall (31) that separates, from a vacuum space inside of a charged particle optical lens barrel (2), a non-vacuum space, in which a sample is placed; an upper electrode (35); a lower electrode (5), on which a sample (100) is placed; a power supply (21) that applies a voltage to the upper electrode and / or the lower electrode; a sample gap adjusting mechanism (9) that adjusts an interval between the sample and the partition wall; and an image forming unit (15) that forms an image of the sample on the basis of a current absorbed by the lower electrode. A secondary electron is selectively measured using amplification effects due to ionization collision between a gas molecule and an electron, said ionization collision being generated when a voltage is applied between the upper electrode and the lower electrode. A detection system uses a method for measuring the value of a current flowing in the lower electrode.

Description

technical field [0001] The present invention relates to a charged particle microscope for acquiring an image of a sample using a charged particle beam. Background technique [0002] Even among microscopes, an electron microscope using electrons as a light source can observe surface shapes on the order of nm. Among them, a scanning electron microscope (hereinafter, SEM) is widely used to observe minute surface shapes and observe composition structures. The SEM is a device that scans an electron beam (primary electron beam) focused on the surface of a sample by an electron lens with a deflector, detects and images emitted electrons generated from the area of ​​the sample irradiated with the electron beam. Emitted electrons include low-energy emitted electrons (hereinafter referred to as secondary electrons) having surface shape information and backscattered electrons (hereinafter referred to as reflected electrons) having composition information having the same energy as prim...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/18H01J37/16H01J37/244
CPCH01J37/16H01J37/18H01J37/244H01J37/28H01J2237/2608H01J37/023H01J37/09H01J37/12H01J37/20H01J2237/036H01J2237/038H01J2237/2003H01J2237/24564H01J2237/2605H01J2237/2826
Inventor 庄子美南津野夏规大南祐介
Owner HITACHI HIGH-TECH CORP