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Magnetic tunnel junction device and random memory device based on artificial antiferromagnetic fixed layer

An artificial antiferromagnetic and magnetic tunnel junction technology, applied in electric solid devices, magnetic field controlled resistors, components of electromagnetic equipment, etc. Achieve strong anti-interference ability, enhance antiferromagnetic coupling strength, and improve the effect of arrangement density

Active Publication Date: 2019-01-18
XI AN JIAOTONG UNIV
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Problems solved by technology

However, the spin polarization current applied to spin-transfer torque-random memory is generally in the range of 10 7 A / cm 2 Left and right, a larger spin-polarized current will limit the arrangement density of the memory cell array. In order to increase the arrangement density of the memory cell array, the thickness of the pinned layer can be reduced. At this time, a larger current may cause the ferromagnetic state of the pinned layer to collapse. changes, unable to write data stably

Method used

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  • Magnetic tunnel junction device and random memory device based on artificial antiferromagnetic fixed layer
  • Magnetic tunnel junction device and random memory device based on artificial antiferromagnetic fixed layer
  • Magnetic tunnel junction device and random memory device based on artificial antiferromagnetic fixed layer

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Embodiment Construction

[0041] The technical solutions of the present invention will be described in detail below in conjunction with the accompanying drawings and examples. The following examples relate to a magnetic random access memory device that enhances the antiferromagnetic coupling of an artificial antiferromagnetic pinned layer through electric field regulation, but does not constitute any limitation on the present invention. in accordance with.

[0042] figure 1 Demonstration of the paper "Low voltage switching of magnetism through ionic liquidgating control of RKKY interaction in FeCoB / Ru / FeCoB and (Pt / Co)2 / Ru / (Co / Pt)2multilayers" in the paper "Low voltage switching of magnetism through ionic liquidgating control of RKKY interaction in FeCoB / Ru / FeCoB and (Pt / Co)2 / Ru / (Co / Pt)2multilayers" Variation of ferromagnetic coupling strength J. When the ferromagnetic layer is [Pt(0.88nm)|Co(0.70nm)] 2 , the degree of interface disorder is 0.5, and the thickness of Ru is 0.66nm, the artificial antif...

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Abstract

The invention discloses a magnetic tunnel junction device and a random memory device based on an artificial antiferromagnetic fixed layer, which relates to a multilayer film structure which can be used as a fixed layer, namely an artificial antiferromagnetic device. The artificial antiferromagnetic device can be used as the fixed layer of the magnetic tunnel junction, and the antiferromagnetic coupling is enhanced under the action of the electric field, so that the ferromagnetic layer close to the barrier layer of the fixed layer is not flipped, so as to realize the stable writing of the data.The magnetic tunnel based on the artificial antiferromagnetic fixed layer is structured into a magnetic random storage device, and the purpose of stably writing data is achieved through the joint action of an electric field and a current. The magnetic tunnel has the advantages of simple structure, high density, low power consumption, high speed, radiation resistance and nonvolatility.

Description

technical field [0001] The present invention relates to circuits and devices with magnetic / ferromagnetic materials or structures and their applications, more specifically, to a magnetic random access memory based on an artificial antiferromagnetic pinned layer controlled by electricity and using an electric field for assisted erasing and writing. Background technique [0002] A magnetic tunnel junction (called MTJ) is composed of two layers of magnetic metal (such as iron, cobalt, nickel) and an ultra-thin insulating layer (such as aluminum oxide, or magnesium oxide) sandwiched between the two magnetic metal layers. If a bias voltage is applied between the two magnetic metal layers, since the insulating layer is very thin, electrons can tunnel through its potential barrier. Under a given bias voltage, the size of the tunneling current / tunneling resistance depends on the relative orientation of the magnetization in the two ferromagnetic layers. This phenomenon is called tunne...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L43/08G11C11/16H10N50/10H10N50/80
CPCG11C11/161H10N50/10H10N50/85H10B61/22H10N50/80
Inventor 闵泰周雪王蕾
Owner XI AN JIAOTONG UNIV
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