A kind of microchannel heat sink and its manufacturing method
A technology of micro-channels and radiators, which is applied to semiconductor devices, electrical solid devices, semiconductor/solid device components, etc., can solve the problems of high process cost, limited quantity, and reduced circuit density, so as to reduce processing difficulty, The upper and lower surfaces are smooth and meet the grounding requirements
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[0056] like Figure 1-10 Shown, a kind of micro-channel heat sink is provided with micro-channel (2), shunt network in it, and the surface is provided with liquid inlet and liquid outlet (3), and the outer surface of described micro-channel heat sink is provided with There is a metal layer (1).
[0057] In the above technical solution, by arranging the metal layer (1) on the surface of the micro-channel heat sink, it not only satisfies the grounding requirements of the high-frequency system well, but also avoids setting deep TSV holes on the micro-channel heat sink, reducing micro The processing difficulty and manufacturing cost of the runner heat sink ensure the integration density of the circuit and the reliability of the structure.
[0058] The micro-channel and shunt network can be in any shape, and the actual shape should be determined according to heat dissipation requirements. Exemplarily, the shape of the microchannel and the shunt network may be: serpentine, spiral,...
Embodiment
[0086] like Figure 1-10 As shown, a microchannel heat sink with a thickness of 400 μm:
[0087] The interior is provided with a micro-channel (2) and a distribution network, the micro-channel and the distribution network are serpentine, the width of the micro-channel (2) is 30 μm, and the depth is 250 μm; the lower surface is provided with a liquid inlet and an outlet The liquid inlet (3), the liquid inlet and the liquid outlet (3) are circular; the outer surface is provided with a metal layer (1), and the metal layer (1) is continuously distributed on the six micro-channel radiators. The surface is made of Au.
[0088] The manufacturing method is as follows:
[0089] 1) Provide two silicon wafers with smooth surface;
[0090] 2) if image 3 As shown, a layer of SiO was grown on the surface of silicon wafer A and the back of silicon wafer B respectively. 2 , and use chemical mechanical polishing technology to control its surface roughness below 1nm;
[0091] 3) if Fig...
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