Uniform gas supply device for vapor deposition furnace, and vapor deposition furnace
A technology of vapor deposition and gas supply device, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of many influencing factors, high control requirements, complicated operation and other problems, to ensure consistency, high Heating efficiency, the effect of ensuring uniformity
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[0046] The purpose, advantages and characteristics of the present invention will be illustrated and explained through the following non-limiting description of preferred embodiments. These embodiments are only typical examples of applying the technical solutions of the present invention, and any technical solutions formed by equivalent substitutions or equivalent transformations fall within the scope of protection of the present invention.
[0047] The present invention discloses a vapor deposition furnace 160, as attached image 3 As shown, a vacuum chamber 8 is included. The vacuum chamber 8 includes a cylindrical vacuum chamber body 81 and a sealed door 82 located at two circular openings of the vacuum chamber body 81. The sealed door 82 and the vacuum The chamber main body 81 is pivotally connected, and the sealed door 82 is preferably hermetically connected to the vacuum chamber main body 81 through four clamps 83 distributed in a rectangular shape.
[0048] As attached image...
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