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Method and device for producing silicon tetrachloride from polycrystalline silicon waste

A technology of silicon tetrachloride and polysilicon, which is applied in the direction of chemical instruments and methods, silicon compounds, silicon halide compounds, etc., can solve the problem that does not involve the recovery of silicon tetrachloride and trichlorosilane components, and does not recover polysilicon atom components, etc. problem, to make full use of the effect

Pending Publication Date: 2019-04-12
内蒙古自治区浩森新材料开发有限公司
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Problems solved by technology

The two treatment processes can recover hexachlorodisilane with a purity of more than 98%, but this process only obtains hexachlorodisilane through physical separation, and does not recover other polysilicon atom components, and does not involve the synthesis of di-silicon atoms and polysilicon atom components Recovery of components converted to silicon tetrachloride and trichlorosilane

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  • Method and device for producing silicon tetrachloride from polycrystalline silicon waste

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Embodiment

[0041] A method for producing silicon tetrachloride by using polysilicon waste, using chlorosilane mixture, a chlorinating agent and a catalyst to produce tetrachlorosilane at a pressure of 0-670kPa and a temperature of 130-320°C.

[0042] As described in this embodiment, the chlorosilane mixture is the chlorosilane raffinate produced by the treated polysilicon, including trichlorosilane, silicon tetrachloride, organochlorosilane SiClnRm (R is a hydrogen atom or an alkyl group, m, n is a natural number), hexachlorodisilane, pentachlorodisilane, tetrachlorodisilane, hexachlorodisiloxane, octachlorotrisilane, decachlorotetrasilane, or a mixture of any of them in any proportion.

[0043] As described in this embodiment, the chlorinating agent is hydrogen chloride, chlorine or a mixture thereof in any proportion.

[0044] Under the action of a catalyst, hydrogen chloride is used as the chlorination agent to react as follows:

[0045] Si x Cl 2x+2 +(x-1)HCl→SiCl 4 +(x-1)SiHCl 3 ...

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Abstract

The invention relates to the technical field of silicon tetrachloride production, in particular to a method for producing silicon tetrachloride from polycrystalline silicon waste. The method is characterized in that tetrachlorosilane is produced by using a chlorosilane mixture, a chlorinating agent and a catalyst at 130-320 DEG C under the 0-670 kPa pressure. The method has the advantages that thereactive distillation technology is adopted to make the per-pass conversion of the chlorosilane and the chlorinating agent as reactants reach 100%, a high boiling substance can be converted into a mixture of silicon tetrachloride and silicon trichloride and can be further purified into silicon tetrachloride and silicon trichloride for the production of polycrystalline silicon and silicon dioxideby the gas phase method, and the resource utilization of chlorosilane residues is achieved.

Description

technical field [0001] The invention relates to the technical field of silicon tetrachloride production, in particular to a method and a device for producing silicon tetrachloride by using polysilicon waste. Background technique [0002] In the production process of polysilicon, it is accompanied by the tail gas of rectification and purification of chlorosilane synthesis reaction, reduction reaction and cold (hot) hydrogenation reaction. A certain amount of raffinate will inevitably be produced. This part of the raffinate has no direct use value in terms of polysilicon production. In addition, because this part of the raffinate has a high solid content and contains high polymers, it has high viscosity and strong oxidation. It is easy to hydrolyze to produce hydrogen chloride, easy to burn, and very dangerous to expose to the air. [0003] The chlorosilane raffinate is mainly composed of the following four parts: [0004] components Element Content (wt%) ...

Claims

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Application Information

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IPC IPC(8): C01B33/107
CPCC01B33/1071
Inventor 贾广宇李旭成光明韩云峰
Owner 内蒙古自治区浩森新材料开发有限公司
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