Magnetron sputtering device for inner cavity of pipe with large length-diameter ratio and method for preparing alpha-Ta coating

A large aspect ratio, magnetron sputtering technology, applied in coating, sputtering, metal material coating process, etc., to achieve the effect of strong flexibility, good coating uniformity and simple operation

Active Publication Date: 2019-05-10
INST OF METAL RESEARCH - CHINESE ACAD OF SCI +1
View PDF8 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, microcracks are unavoidable defects in chrome plating of pipe fittings

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Magnetron sputtering device for inner cavity of pipe with large length-diameter ratio and method for preparing alpha-Ta coating
  • Magnetron sputtering device for inner cavity of pipe with large length-diameter ratio and method for preparing alpha-Ta coating
  • Magnetron sputtering device for inner cavity of pipe with large length-diameter ratio and method for preparing alpha-Ta coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] Using a cylindrical tantalum target with a diameter of 150mm and a large aspect ratio (13:1) inner cavity as the substrate, and a target purity of 99.99wt%, the diameter of the inner cavity with a large aspect ratio is the same as that of the target The diameter difference of the outer wall is 60mm (after adjusting the process parameters, the inner wall of the substrate can be placed within the negative glow area), and the inner cavity with a large aspect ratio is degreased and cleaned on the surface, then loaded into a cylindrical target and connected to a vacuum unit; Draw below 2×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 150°C, and then pump the background vacuum to 7×10 -3 Pa. Infuse argon to 4.0×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 3.3W / cm 2 , the deposition time is 12 hours.

[0052] Observing the cross section and surface of the deposited tantalum coating, it can...

Embodiment 2

[0054] The inner cavity with a diameter of 150mm and a large aspect ratio (aspect ratio of 20:1) is used as the substrate, the purity of the tantalum target is 99.99wt%, and the diameter difference between the inner cavity with a large aspect ratio and the outer wall of the target is 65mm (adjust the process parameters Finally, the inner wall of the matrix can be placed within the range of the negative glow area), and the inner cavity with a large aspect ratio is degreased and cleaned on the surface, and then loaded into a cylindrical target and connected to a vacuum unit; -2 Pa, turn on the heater, heat the surrounding of the sample to 250°C, and then pump the background vacuum to 5×10 -3 Pa. Inject argon to 2.5×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 5W / cm 2 , the deposition time is 12 hours.

[0055] Observation of the cross-section and surface of the deposited tantalum coating shows that the coating ha...

Embodiment 3

[0057] The inner cavity with a diameter of 125mm and a large aspect ratio (aspect ratio of 15:1) is used as the substrate, the purity of the tantalum target is 99.99wt%, and the diameter difference between the inner cavity with a large aspect ratio and the outer wall of the target is 55mm (adjust the process parameters Afterwards, the inner wall of the matrix can be placed within the scope of the negative glow area), the inner wall of the barrel is degreased and cleaned, and then loaded into a cylindrical target and connected to a vacuum unit; the inner wall of the barrel is vacuumed to less than 3×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 200°C, and then pump the background vacuum to 4×10 - 3 Pa. Inject argon to 6.0×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 2.6W / cm 2 , a deposition time of 4 hours.

[0058] Observation of the cross-section and surface of the deposited tantalum coa...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a magnetron sputtering device for an inner cavity of a pipe with a large length-diameter ratio and a method for preparing an alpha-Ta coating, and belongs to the technical field of a magnetron sputtering coating. The device uses a large length-diameter ratio cavity of the pipe as a vacuum cavity, one end of the large length-diameter ratio cavity is connected with a vacuum unit through a vacuum end adapter, the other end of the large length-diameter ratio cavity is connected with a cylindrical magnetron target through a target material adapter, the cylindrical magnetrontarget is arranged in the large length-diameter ratio cavity, and after magnetron sputtering parameters are adjusted, the surface of the inner wall of the pipe is in a negative glow region of glow discharge. According to the device and the method, the 100% alpha-Ta coating can be deposited, and the ablation resistance of the coating is obviously superior to that of a conventional electroplating chromium coating, so that a chrome plating process which is used on a large scale at the present stage and causes severe environment pollution can be replaced. The device and the method are used for preparing the protective coating of the inner cavity of the pipe with the large length-diameter ratio.

Description

Technical field: [0001] The invention relates to the technical field of magnetron sputtering coating, in particular to a magnetron sputtering device and a method for preparing an α-Ta coating in a large aspect ratio pipe cavity, which can be applied to various types of large aspect ratio pipe cavity preparation of protective coatings. Background technique: [0002] At present, in practical industrial applications, there are a large number of pipe fittings with large length-to-diameter ratio that need to be modified, such as oil pipelines, chemical pipelines, automobile cylinder liners, and the inner wall of aircraft landing gear; in the field of national defense, tanks, army large Aspect ratio pipe fittings, fish launch tubes and missile launch tubes, etc. Especially in the military field, due to the dimensional changes caused by the rifling wear on the inner wall of the pipe fittings, the shooting accuracy will be reduced, the tactical performance will be reduced, and even...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/35C23C14/14C23C14/04
Inventor 牛云松朱圣龙王福会陈明辉
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap