Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-speed 3D micro-nanometer printing control method, model slicing method and model slicing device based on femtosecond laser

A femtosecond laser and printing model technology, applied in the field of 3D micro-nano printing, can solve the problems of low printing accuracy, low printing efficiency, incomplete application of microstructure, etc., to reduce the amount of data, improve the speed, and improve the efficiency of program execution. Effect

Active Publication Date: 2019-05-21
杭州志英科技有限公司
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] At present, the model slicing used for two-photon printing mostly adopts open source algorithms. Such open source model slicing algorithms are generally suitable for 3D printing of macroscopic model structures, but not fully applicable to microscopic structures.
When the microstructure model is sliced ​​with the open source model slicing algorithm and then 3D printed, there are often defects such as low printing efficiency and low printing accuracy.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-speed 3D micro-nanometer printing control method, model slicing method and model slicing device based on femtosecond laser
  • High-speed 3D micro-nanometer printing control method, model slicing method and model slicing device based on femtosecond laser
  • High-speed 3D micro-nanometer printing control method, model slicing method and model slicing device based on femtosecond laser

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0064] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be noted that the following embodiments are intended to facilitate the understanding of the present invention, but do not limit it in any way.

[0065] The structure of the two-photon printing system used in the present invention is as follows: figure 1 shown. The laser beam is emitted by a femtosecond laser, passes through an optical switch, and is tightly focused into the interior of the photoresist by a high-magnification objective lens. The optical switch is used to control the on-off of the optical path. According to the requirements, an optical power control system can be added before the optical switch to adjust the laser energy. The vibrating mirror is used to control the laser focus to perform two-dimensional scanning on the focal plane of the objective lens. The Z-axis piezoelectric translation stage is used to lift the sampl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of 3D micro-nanometer printing, in particular to a high-speed 3D micro-nanometer printing control method, model slicing method and model slicing device based on femtosecond laser. The model slicing method comprises the steps that i, coordinate data of dispersing points filling a whole 3D model are obtained; ii, all the dispersing points are layered to obtain the coordinate data of the dispersing points on each layer; iii, the dispersing points of each layer are divided into lines according to y coordinate values of the dispersing points to obtain the coordinate data of the dispersing points on each line; iv, the dispersing points are ranked sequentially according to the sequence of the lines and the layers, and the sequence of the coordinate data of all the dispersing points is obtained; and v, according to the sequence of all the dispersing points in the sequence, whether the dispersing points are starting points or finishing points of continuous line sections or not is judged sequentially, and if no, the dispersing points are removed from the sequence. The high-speed 3D micro-nanometer printing control method and the high-speed 3D micro-nanometer printing model slicing method are used in mutual cooperation, and the 3D micro-nanometer printing speed and precision can be increased and improved greatly.

Description

technical field [0001] The present invention relates to the technical field of 3D micro-nano printing, in particular to a femtosecond laser-based high-speed 3D micro-nano printing control method, model slicing method and device. Background technique [0002] Two-photon printing is a new type of laser direct writing technology, and its scientific name is femtosecond laser-induced two-photon polymerization. Femtosecond laser is a kind of pulsed laser, generally the duration of a single pulse is on the order of tens to hundreds of femtoseconds; two-photon polymerization is a kind of photocuring effect, some material molecules will be absorbed after absorbing two photons of the same or different wavelengths. Polymerization occurs, converting from liquid to solid. [0003] Two-photon printing is a potential 3D micro-nano printing technology, which can realize 100nm level or even finer precision structure processing, and can be applied in many high-precision fields, such as: micr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B29C64/135B29C64/386B33Y50/00
Inventor 魏一振王洪庆
Owner 杭州志英科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products